CFET Conductive Line Layout With Asymmetric Front-Back Routing

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Solution Overview

Problem

The existing integrated circuit (IC) designs face challenges in optimizing the performance and flexibility of complementary field-effect transistor (CFET) devices, particularly in reducing resistance and signal interference, while maintaining compact design and routing efficiency.

Innovation Solution

The implementation of asymmetric front-side and back-side conductive line arrangements, including power, signal, and shielding lines, which allow for flexible pitch and reduced redesign costs, along with methods for signal connection between transistors such as source/drain terminal connections, gate connections, and vias, enhances CFET performance and routing resources.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If symmetric front-side and back-side conductive line arrangements are used, then manufacturing simplicity is maintained, but resistance and signal interference increase

Engineering Contradiction:
Improvesignal interference reductionVSAvoidconductive line arrangement complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies asymmetry by configuring the front-side conductive lines (power, signal, shielding) with different patterns and positions than the back-side conductive lines. Specifically, the front-side has a shielding line adjacent to signal lines while the back-side uses a different arrangement, creating asymmetric current paths that reduce signal interference and resistance without requiring complete redesign of the entire conductive system

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent implements local quality by optimizing specific regions of the conductive line arrangement rather than applying uniform symmetry throughout. The front-side and back-side have locally differentiated configurations where shielding lines are positioned adjacent to signal lines in specific areas, and power lines are routed through different paths, allowing targeted reduction of resistance and interference in critical regions

Inventive Principle:
Principle #3Local quality

2Adaptability or versatility

If compact CFET design is maintained, then area efficiency is improved, but routing flexibility and pitch optimization are limited

Engineering Contradiction:
Improverouting flexibilityVSAvoidcell height
Core Design Contradiction:
Adaptability or versatilityVSArea of stationary object

Solution Approach 1:

The patent utilizes the vertical dimension by implementing asymmetric conductive line arrangements on both front-side and back-side of the CFET structure. This allows routing flexibility to be achieved through vertical stacking and layered configurations rather than lateral expansion, enabling pitch optimization and routing adaptability while maintaining compact cell footprint and height

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Reliability

If conventional conductive line arrangements are used, then design simplicity is maintained, but resistance and signal interference increase

Engineering Contradiction:
ImproveCFET performanceVSAvoidredesign cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent applies preliminary action by pre-configuring asymmetric conductive line arrangements with optimized shielding line positions and power line routing paths during the design phase. This preliminary optimization of the conductive topology reduces resistance and signal interference before manufacturing, improving CFET performance without requiring costly post-manufacturing redesign or reconfiguration

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS11862562B2Integrated circuit conductive line arrangement for circuit structures, and method
Publication Date: 2024.01.02 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11862562B2 patent drawing
  • US11862562B2 patent drawing
  • US11862562B2 patent drawing

AI summary

A circuit structure includes a substrate that includes a first transistor stack over the substrate that includes: a first transistor where the first transistor is a first conductivity type; and a second transistor, above the first transistor, where the second transistor is a second conductivity type different from the first conductivity type. The structure also includes a plurality of first conductive lines in a first metal layer above the first transistor stack, the plurality of first conductive lines electrically connected to the first transistor stack. The structure also includes a plurality of second conductive lines in a second metal layer below the substrate and underneath the first transistor stack, the plurality of second conductive lines electrically connected to the first transistor stack. The plurality of first conductive lines are configured asymmetrically with respect to the plurality of second conductive lines.