Process Chamber Guide Sealing for Low-Particle Substrate Transport
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Solution Overview
Problem
Existing process chamber guides face issues with particle entry, sluggish movement, and reduced layer quality due to abrasion, which affects the sealing and gas containment during substrate carrier movement in the process chamber.
Innovation Solution
The process chamber guide features a sealing surface and a sealing web that maintain a precise distance from the substrate carrier, combined with roller bearings and guide elements to ensure effective sealing and mobility, preventing particle penetration and gas leakage, and utilizing flushing gas to maintain cleanliness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a process chamber guide with sliding rails is used to guide the substrate carrier, then the substrate carrier can be moved in a straight line, but particles can enter the guide, causing sluggish movement or blocking
Solution Approach 1:
The harmful element (particles) is excluded from the guide system by implementing a sealed guide structure where the sealing surface and sealing web prevent particle entry into the guide groove, thereby maintaining reliable movement without interruption
Solution Approach 2:
A sealing web (thin film structure) is introduced between the substrate carrier and process chamber guide to prevent particle penetration while allowing the substrate carrier to move smoothly along the guide direction
2Device complexity
If sliding rails are used for guiding the substrate carrier, then the structure is simple, but abrasion occurs which reduces layer quality
Solution Approach 1:
The sliding friction mechanism is replaced with a rolling friction mechanism by introducing roller bearings that rotate in the guide groove, significantly reducing abrasion and preventing particle generation that would compromise layer quality
3Reliability
If the sealing surface is placed close to the substrate carrier to improve sealing, then gas containment improves, but friction and particle risk increase
Solution Approach 1:
A sealing web is introduced as an intermediary element between the substrate carrier and process chamber guide, creating an effective seal at a larger distance that prevents particle penetration while reducing friction compared to direct contact sealing
Solution Approach 2:
The harmful contact between sealing surfaces is eliminated by using a sealing web that maintains separation, preventing particle generation from friction while still achieving effective gas containment
Data Source
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AI summary
The invention relates to a process chamber guide, designed for linearly guiding a substrate carrier that can be displaced in the process chamber guide in a direction of guidance such that by means of displacement of the substrate carrier in a process position, an at least regional demarcation of a process chamber guide can be formed by the process chamber guide and substrate carrier. The invention is characterized in that the process chamber guide has a roller bearing for the substrate support and at least one sealing surface, which extends parallel to the direction of guidance and is designed and arranged in such a way that, whenever the substrate carrier arranged in the process chamber guide is in process position, the sealing surface is spaced apart less than 1 mm from the substrate carrier. The invention further relates to a process chamber and to a method for guiding a substrate carrier in a process position.