Chamfering Table Flatness Measurement via Substrate Symmetry
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Solution Overview
Problem
The existing methods for measuring the flatness of chamfering tables are inefficient, leading to labor and time losses due to trial-and-error adjustments, as the degree of deformation cannot be accurately determined, and direct measurement is hazardous and prone to errors.
Innovation Solution
A method that involves positioning a substrate on the chamfering table, chamfering its edge multiple times with a varying chamfering wheel height, locating symmetric chamfered points, and matching the wheel's height values to these points to quantify the table's flatness, allowing for automated monitoring and minimizing measurement errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If direct measurement of chamfering table flatness is performed, then measurement accuracy is improved, but worker safety deteriorates and equipment downtime increases
Solution Approach 1:
The patent uses the substrate as an intermediary object to indirectly measure the chamfering table flatness. Instead of directly measuring the table surface, the method measures the chamfered edges of substrates processed on the table, thereby inferring the table's flatness condition without worker exposure to hazardous environments or equipment downtime
Solution Approach 2:
The patent creates a copy of the measurement information by measuring the substrate edges rather than the table surface directly. The chamfered substrate edges serve as a replica that contains information about the table's flatness, allowing indirect assessment without direct contact with the measurement target
2Device complexity
If traditional trial-and-error adjustment is used, then equipment complexity is reduced, but productivity deteriorates due to repeated adjustments
Solution Approach 1:
The patent implements a feedback mechanism by measuring the actual chamfered positions and comparing them to ideal positions. The system provides quantitative feedback about flatness deviations, enabling precise compensation adjustments rather than trial-and-error methods, thereby improving productivity without excessive complexity
Solution Approach 2:
The patent replaces manual trial-and-error mechanical adjustment with an automated measurement and calculation system. By using coordinate data from substrate edges and computational algorithms, the system determines precise adjustment amounts, eliminating repeated manual adjustments and improving efficiency
3Manufacturing precision
If quantized flatness measurement is implemented, then manufacturing precision is improved, but device complexity increases due to automated measurement systems
Solution Approach 1:
The patent enables the chamfering process itself to generate measurement data. The substrate edges, after being chamfered, inherently contain information about table flatness through their geometric features. This self-service approach allows the process to simultaneously produce and measure, reducing the need for separate complex measurement equipment
Solution Approach 2:
The patent makes the substrate serve multiple functions: it is both the workpiece being processed and the measurement standard. The same substrate that undergoes chamfering also provides the reference geometry for measuring table flatness, eliminating the need for separate specialized measurement tools and reducing overall system complexity
Data Source
AI summary
A method of measuring a flatness of a chamfering table includes the steps of positioning a substrate on the chamfering table, chamfering an edge of the substrate a plurality of times with a chamfering wheel while varying a relative height of the chamfering wheel with respect to a height of the substrate, locating symmetric chamfered points where the chamfered edge is top-bottom symmetric, matching values of the relative height of the chamfering wheel to the found symmetric chamfered points, and obtaining the flatness of the chamfering table from the values of the relative height of the chamfering wheel that are matched to the symmetric chamfered points.