Charged Particle Beam Device High Resolution 3D Analysis
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Solution Overview
Problem
Current charged particle beam devices, such as scanning electron microscopes, have limited analytical resolution, making it difficult to generate high-resolution 3D data sets for materials like sedimentary rocks, as methods like EDX, WDX, and EBSD are limited to a resolution of about 1 µm, which is insufficient for analyzing features smaller than 1 µm.
Innovation Solution
A method using a charged particle beam device with two beam generators and objective lenses for generating and focusing charged particle beams, allowing sequential material removal and imaging with high resolution (1 nm to 3 nm), and analyzing lamellas with thicknesses of 10 nm to 100 nm to achieve high-resolution 3D analytical data sets.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional EDX, WDX, and EBSD methods are used for material analysis, then the analysis can be performed on bulk samples, but the analytical resolution is limited to about 1 µm, which is insufficient for analyzing features smaller than 1 µm
Solution Approach 1:
The method segments the bulk sample by sequentially removing material layers to expose new surfaces for analysis. This allows the analytical resolution to be improved by analyzing thin lamellas (10-100 nm) rather than bulk material, while the overall device structure remains a conventional charged particle beam device
Solution Approach 2:
The invention transitions from analyzing bulk samples in three dimensions to analyzing thin lamellas in two dimensions. By creating and analyzing thin sections (lamellas) of the sample, the method achieves higher analytical resolution (1 nm to 3 nm) while maintaining compatibility with conventional EDX, WDX, and EBSD detection systems
2Measurement precision
If material is sequentially removed to expose new surfaces for high-resolution imaging, then high-resolution 3D data can be obtained, but the process time increases significantly
Solution Approach 1:
The method performs preliminary material removal to create thin lamellas (10-100 nm) before the actual high-resolution imaging and analysis. This preliminary preparation enables faster subsequent imaging and analysis at high resolution, as the thin lamellas allow for quicker data acquisition compared to analyzing thick bulk samples
Solution Approach 2:
The method employs periodic cycles of material removal followed by imaging/analysis. By alternating between removing material layers and performing high-resolution characterization, the process achieves both high imaging resolution and reasonable process time through efficient use of the charged particle beam for both milling and imaging functions
3Measurement precision
If conventional charged particle beam devices are used for analysis, then the device structure remains simple, but the analytical resolution is insufficient for analyzing small-scale material features
Solution Approach 1:
The method changes the physical parameters of the sample by transforming bulk material into thin lamellas (10-100 nm thickness). This parameter change enables conventional charged particle beam devices to achieve higher analytical resolution (1 nm to 3 nm) without requiring modifications to the device structure, maintaining ease of manufacture while improving measurement precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the generation of high-resolution 3D analytical data sets with improved analytical capabilities, allowing for precise identification of material characteristics, such as composition and phases, by combining high-resolution imaging with techniques like EDX, WDX, and EBSD, providing detailed insights into small-scale material features.
Implementation Method 1
guiding a first charged particle beam over the object and removing material from the object with the first charged particle beam
Implementation Method 2
guiding a second charged particle beam over the first surface of the object, detecting interaction particles which arise when the second charged particle beam impinges on the first surface
Implementation Method 3
a first objective lens for focusing the first charged particle beam onto the object
Data Source
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AI summary
The invention relates to a method for analyzing an object using a charged particle beam device generating a beam of charged particles. Moreover, the invention relates to a charged particle beam device for carrying out this method. In particular, the charged particle beam device is an electron beam device and/or an ion beam device. The charged particle beam device is used to generate high resolution 3D data sets by sequentially removing material from the object, exposing surfaces of the object and generating images of the surfaces. When removing material from the object, an opening is generated in the object. The opening comprises sides. Lamellas are generated comprising the sides. Material characteristics of those lamellas are identified. Moreover, filtered data is generated for each pixel of images of the sides of the opening. The method uses the information with respect to the identified material characteristics, the images of the sides and the filtered data of those images to obtain information on the material characteristics for each pixel of each surface generated when sequentially removing material from the object.