Charged Particle Beam Device Pattern Identification via Irradiation Marks
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Solution Overview
Problem
Existing charged particle beam devices face challenges in accurately identifying and measuring repeated dense patterns formed by techniques like SADP or SAQP due to instability in roughness evaluation and changes in profile shape, especially when the scanning line direction and pattern quality vary.
Innovation Solution
A charged particle beam device that includes a deflector and a stage, controlled by a control device to form irradiation marks and acquire images at different field of views, allowing for the synthesis of images based on these marks to enhance measurement accuracy across a wide region.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If roughness evaluation is used to identify patterns, then pattern identification can be performed, but identification accuracy deteriorates when roughness occurrence is unstable
Solution Approach 1:
The patent uses irradiation marks (contamination) as visual indicators to identify pattern positions. By forming marks at specific pattern locations and detecting their presence in images, the system achieves reliable pattern identification that is not affected by roughness variations. The marks act as stable reference points analogous to using distinct visual markers.
Solution Approach 2:
The irradiation marks serve as intermediary reference objects between the measurement system and the patterns. These marks are deliberately formed on the sample and used as mediators to establish accurate positional relationships and enable pattern identification without relying directly on pattern roughness characteristics.
2Measurement precision
If clear relevance irradiation is used to identify pattern types, then identification accuracy improves, but profile shape changes depending on end quality and scanning direction
Solution Approach 1:
The system performs preliminary formation of irradiation marks at specific pattern positions before conducting the actual measurement. These pre-formed marks remain stable throughout the measurement process and serve as reliable reference points for identifying pattern types and positions, eliminating the need to rely on profile shapes that may vary with scanning conditions.
Solution Approach 2:
The patent creates copies of reference marks at known pattern locations. These mark copies serve as stable reference representations that can be detected and used for identification purposes without being affected by the original pattern's profile variations or scanning direction dependencies.
3Area of stationary object
If single field of view imaging is used, then imaging process is simple, but measurement range is limited and accuracy over wide region is reduced
Solution Approach 1:
The patent divides the wide measurement area into multiple overlapping fields of view. Each field of view contains irradiation marks that serve as reference points. By segmenting the imaging process into multiple overlapping views and using the marks for alignment, the system achieves both wide coverage and high accuracy without requiring excessively complex single-view imaging.
Solution Approach 2:
The system combines multiple images of overlapping fields of view into a comprehensive measurement result. The irradiation marks in the overlapping regions serve as reference points for aligning and merging the images, enabling accurate wide-area measurement by integrating information from multiple views.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables high-accuracy imaging and measurement of wide regions, overcoming the limitations of previous technologies in accurately identifying and measuring repeated dense patterns by leveraging contamination as a reference for image synthesis.
Implementation Method 1
a deflector which deflects a charged particle beam emitted from a charged particle source
Implementation Method 2
a charged particle beam device which includes a deflector which deflects a charged particle beam emitted from a charged particle source
Data Source
AI summary
The purpose of the present invention is to provide a charged particle beam device with which it is possible to identify, to a high degree of accuracy, repeat patterns generated by a multiple exposure method such as SADP or SAQP. In order to achieve this purpose, there is proposed a charged particle beam device for: irradiating a first position on a sample with a charged particle beam to form an irradiation mark on the sample; after the formation of the irradiation mark, scanning the charged particle beam on a first visual field which includes the first position and which is larger than the irradiation mark, and thereby acquiring a first image; scanning the charged particle beam on a second visual field which includes the first position, which is larger than the irradiation mark, and which is in a different position from the first visual field, thereby acquiring a second image; and synthesizing the first image and the second image so as to overlap the irradiation marks included in the first image and the second image.