Charged Particle Beam Drawing Data Redundancy Reduction
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Solution Overview
Problem
Existing drawing apparatuses with multiple electron optical systems face challenges in managing and handling large quantities of drawing data due to redundant data generation for each system, and mechanical adjustments for precision are imprecise, affecting drawing precision and productivity.
Innovation Solution
A drawing apparatus with a controller that determines the appropriate charged particle beams for each optical system to satisfy the relation SW=Pc/α=Ps/β, allowing for shared intermediate data storage and precise adjustments without mechanical changes, ensuring that the stripe width is a divisor of both shot region and drawing region pitches, thereby reducing data redundancy and improving precision.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple electron optical systems are used to perform drawing simultaneously on multiple shot regions, then productivity is improved, but the quantity of drawing data to be held and handled increases
Solution Approach 1:
The patent merges the drawing data handling of multiple electron optical systems by determining beam usage for each system based on a unified set of drawing data. Instead of each system having independent redundant data, the controller coordinates beam selection across systems using shared data, reducing total data quantity while maintaining simultaneous operation capability
Solution Approach 2:
The patent makes the drawing data universal across multiple electron optical systems by using the same drawing data for coordinating beam usage in different systems. The controller determines which beams to use in each system based on the same underlying drawing data, allowing one set of data to serve multiple systems simultaneously
2Adaptability or versatility
If mechanical adjustment is used to adjust distances between optical axes of electron optical systems, then adaptability is improved, but manufacturing precision deteriorates
Solution Approach 1:
The patent replaces mechanical adjustment of optical axis distances with a control system that determines beam usage based on mathematical relationships. Instead of physically moving components to adapt to different configurations, the controller adjusts which beams are used in each electron optical system according to the relation SW=Pc/α=Ps/β, achieving adaptability through software control rather than mechanical movement
Solution Approach 2:
The patent changes the operational parameters of the electron optical systems by determining different beam usage patterns for each system based on the mathematical relationship. Rather than changing physical distances between systems, the controller modifies which beams are active in each system, achieving configuration flexibility through parameter adjustment rather than mechanical change
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces data storage requirements, enhances drawing precision by allowing shared data handling, and maintains productivity by ensuring that drawing regions do not overlap, thus improving the overall efficiency and accuracy of the drawing process.
Implementation Method 1
a plurality of charged particle optical systems each configured to irradiate the substrate with a plurality of charged particle beams
Data Source
AI summary
A drawing apparatus includes: plural charged particle optical systems arrayed at a pitch in a first direction, each configured to irradiate a substrate with charged particle beams; a stage configured to hold the substrate and be moved relative to the charged particle optical systems in a second direction orthogonal to the first direction; and a controller configured to determine charged particle beams for the drawing with respect to each charged particle optical system so as to satisfy a relation given by SW=Pc/α=Ps/(β where Ps is an array pitch of shot regions in the first direction, SW is a width, in the first direction, of each drawing region by each charged particle optical system, Pc be an array pitch of drawing regions in the first direction, and α and β are natural numbers.