Charged Particle Optics Adjustment via Spot Pattern Analysis

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Solution Overview

Problem

Existing charged particle beam apparatuses require significant operator expertise and time to adjust optics accurately, leading to variations in performance and potential sample damage due to fast processing speeds, especially in heavy-current areas where focusing is challenging.

Innovation Solution

A charged particle beam apparatus with a control unit that forms multiple spot patterns on a sample surface using different input values for charged particle optics, analyzing these patterns to select the one with the smallest spot characteristic value, and adjusting the optics accordingly to achieve desired beam characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If manual adjustment of charged particle optics is performed by operators, then beam focusing and astigmatism correction can be achieved, but significant operator expertise and time are required leading to variations in performance

Engineering Contradiction:
Improveoptics adjustment precisionVSAvoidadjustment time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The system performs self-adjustment of charged particle optics by automatically forming spot patterns, measuring their characteristics, and determining optimal input values without operator intervention. The control unit autonomously completes the entire adjustment process from spot pattern formation to final optics parameter setting.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system uses feedback from spot pattern measurements to iteratively determine optimal input values for charged particle optics. The measured spot characteristics are fed back to the control unit, which adjusts the optics parameters accordingly to achieve desired beam focusing and astigmatism correction.

Inventive Principle:
Principle #23Feedback

2Productivity

If fast processing speed is used in heavy-current areas, then productivity increases, but sample damage occurs due to inadequate focusing

Engineering Contradiction:
Improveprocessing speedVSAvoidsample damage
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The system performs preliminary adjustment of charged particle optics by determining optimal input values through spot pattern analysis before actual sample processing begins. This pre-adjustment ensures proper focusing and astigmatism correction are in place, preventing sample damage during high-speed processing.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system replaces manual mechanical adjustment with automated electronic control. The control unit electronically determines optimal input values based on spot pattern measurements, substituting the mechanical/manual adjustment process with an automated electronic system that ensures consistent, precise optics configuration.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Extent of automation

If automated spot pattern analysis is implemented, then operator dependency decreases and adjustment accuracy increases, but device complexity increases

Engineering Contradiction:
Improveadjustment automationVSAvoidcontrol system complexity
Core Design Contradiction:
Extent of automationVSDevice complexity

Solution Approach 1:

The control unit performs multiple functions: it controls spot pattern formation, measures spot characteristics, determines optimal input values, and adjusts optics parameters. By consolidating these functions into a single multi-functional control unit, the system achieves high automation without proportionally increasing overall device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

Spot patterns serve as an intermediary medium between the charged particle beam and the measurement system. By analyzing the characteristics of these intermediate spot patterns rather than directly measuring beam parameters, the system achieves automated optics adjustment through a manageable measurement interface.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables rapid and accurate adjustment of charged particle optics, reducing operator dependency and sample damage by automating the process of setting optimal input values for beam characteristics, ensuring high precision and consistency.

Implementation Method 1

charged particle optics configured to act electromagnetically on the basis of an input value, and set the charged particle beam to a beam characteristic value corresponding to the input value

Methodology Applied
Scientific EffectElectromagnetic action: Lorentz Force

Implementation Method 2

an electrostatic lens as an objective lens which causes the focused ion beam to be focused by forming an electric field by an applied voltage

Methodology Applied
Scientific EffectElectrostatic lens focusing: Electrostatic Lens

Implementation Method 3

The astigmatism correction mechanism corrects the astigmatism of the focused ion beam by forming an electric field by, for example, using two pairs of quadrupoles

Methodology Applied
Scientific EffectElectric field formation: Electric Field

Implementation Method 4

includes a magnetic field lens as the objective lens and the astigmatic correction mechanism, each forming a magnetic field which acts on the electron beam

Methodology Applied
Scientific EffectMagnetic field formation: Magnetic Field

Data Source

PatentUS8698105B2Charged particle beam apparatus and method of adjusting charged particle optics
Publication Date: 2014.04.15 HITACHI HIGH TECH ANALYSIS CORP
  • US8698105B2 patent drawing
  • US8698105B2 patent drawing
  • US8698105B2 patent drawing

AI summary

A charged particle beam apparatus which is able to adjust charged particle optics easily in a short time with a high degree of accuracy and a method of adjusting charged particle optics are provided. A charged particle beam apparatus 1 includes a charged particle source 9, charged particle optics 12, 16 configured to set the ion beam I to a bean characteristic value corresponding to an input value to cause a sample to be irradiated therewith, scanning means 17 configured to be able to move the irradiation point of the charged particle beam I relatively with each other, observing means 32 being capable of obtaining an image, and a control unit 30, and the control unit 30 includes spot pattern forming means 33 configured to set the input value to different values and cause the sample to be irradiated with the charged particle beam I by a plurality of times at different positions to form a plurality of spot patterns and spot pattern analyzing means 34 configured to select a spot pattern having a smallest characteristic value, and sets the input values of the charged particle optics 12, 16 to a value equal to the input value corresponding to the selected spot pattern.