Electrically Charged Steam Bar for Slurry Adhesion Prevention
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in efficiently preventing slurry from adhering to steam bars during the polishing process, which can lead to contamination and affect the quality of substrate processing.
Innovation Solution
A substrate processing apparatus equipped with a steam bar power supply to charge the steam bar with the same electrical charge as the slurry, combined with a slurry arm that can adjust its distance and angle of steam spray, and a shutter to control the direction of steam, preventing slurry adhesion and ensuring effective polishing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a steam bar is used to spray steam for polishing, then the polishing process is improved, but slurry adheres to the steam bar causing contamination
Solution Approach 1:
The patent applies parameter changes by electrically charging the steam bar with a specific voltage (e.g., +1000V to +2000V) to alter its surface properties. This electrical charge parameter change creates electrostatic repulsion that prevents slurry from adhering to the steam bar, while maintaining the steam spraying function for effective polishing.
Solution Approach 2:
The patent converts the potentially harmful effect of electrostatic attraction (which would cause slurry adhesion) into a beneficial effect by applying a voltage of the same sign as the slurry charge. This creates electrostatic repulsion that prevents contamination, turning what could be a harmful attraction force into a protective repulsion force.
2Productivity
If the steam bar is positioned close to the polishing pad for effective steam delivery, then polishing efficiency is improved, but slurry more easily adheres to the steam bar
Solution Approach 1:
The patent resolves this spatial contradiction by changing the electrical parameter of the steam bar. By applying a voltage (e.g., +1000V to +2000V) that creates electrostatic repulsion, the system can maintain close proximity between the steam bar and polishing pad for efficient steam delivery while preventing slurry adhesion through the electrical charge barrier.
3Object-generated harmful factors
If the steam bar is charged with high voltage to prevent slurry adhesion, then contamination is reduced, but energy consumption increases
Solution Approach 1:
The patent optimizes the voltage parameter to balance contamination prevention with energy efficiency. By applying a moderate voltage range (e.g., +1000V to +2000V) rather than extremely high voltage, the system achieves sufficient electrostatic repulsion to prevent slurry adhesion while minimizing energy consumption. The controller adjusts the voltage based on actual polishing conditions.
Solution Approach 2:
The system incorporates feedback control where the controller monitors the polishing process and adjusts the steam bar voltage accordingly. This feedback mechanism ensures that sufficient voltage is applied to prevent contamination while avoiding excessive energy consumption by optimizing the voltage level based on real-time process conditions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents slurry from adhering to the steam bar, maintaining the cleanliness of the apparatus and enhancing the polishing process by adjusting the charge, distance, and angle of steam spray, thereby improving substrate processing quality.
Implementation Method 1
a steam bar power supply configured to apply a voltage to the steam bar and to electrically charge the steam bar
Implementation Method 2
a steam nozzle configured to spray the steam
Data Source
AI summary
A substrate processing apparatus includes a platen that supports a polishing pad and rotates about a first axis extending in a first direction, a polishing head supporting a substrate and disposed on the platen, and a slurry arm capable of supplying slurry onto the platen, wherein the slurry arm includes a slurry arm body disposed on the platen and extending in a second direction perpendicular to the first direction, a steam bar combined with the slurry arm body and capable of spraying water vapor, and a steam bar power supply capable of applying a voltage to the steam bar such that the steam bar has an electric charge, and the steam bar includes a steam nozzle spraying the water vapor and extending to the platen.