Chemical Solution Inspection Using Dual-Region Resistance Sensing

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Solution Overview

Problem

Existing semiconductor manufacturing processes face challenges in accurately inspecting and removing micro- and nano-sized particles and bubbles in chemical solutions due to their different characteristics and generating causes, which affect production yield, and current equipment is large and expensive.

Innovation Solution

A chemical solution inspecting apparatus with a simple structure that includes a base unit, flow path unit, detecting unit, and determining unit to differentiate between particles and bubbles by analyzing electrical signals from different regions of varying fluid velocities.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If expensive and large-sized equipment like SURFSCAN is used to detect particles and bubbles, then detection capability is improved, but device complexity and cost increase

Engineering Contradiction:
Improvedetection capabilityVSAvoidequipment size and cost
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent replaces complex optical detection systems (SURFSCAN) with a simple electrical resistance measurement system. By measuring changes in electrical resistance caused by particles and bubbles in the chemical solution, the system achieves detection capability without requiring expensive and large-sized equipment. The detecting unit uses electrodes to measure resistance changes as particles/bubbles pass through the measurement region.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent employs a simple, low-cost detection mechanism using basic electrical components (electrodes, resistance measurement circuitry) instead of expensive optical equipment. This approach uses inexpensive elements that can be easily replaced or modified, significantly reducing device complexity and cost while maintaining functional detection capability.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

2Speed

If flow velocity is increased to improve particle and bubble detection, then detection speed is improved, but fluid dynamics become more complex affecting measurement accuracy

Engineering Contradiction:
Improvefluid velocityVSAvoiddetection accuracy
Core Design Contradiction:
SpeedVSMeasurement precision

Solution Approach 1:

The patent optimizes the flow velocity parameter to a specific range that balances detection speed and measurement accuracy. By carefully controlling the fluid velocity, the system ensures that particles and bubbles pass through the measurement region at speeds that allow accurate resistance measurement while maintaining efficient processing. The flow velocity is adjusted as a key parameter to resolve the trade-off between speed and precision.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables accurate and cost-effective detection and discrimination of particles and bubbles in chemical solutions, improving semiconductor production yield without requiring expensive equipment.

Implementation Method 1

a detecting unit which measures electrical resistance of the chemical solution moving in the flow path unit

Methodology Applied
Scientific EffectElectrical resistance measurement: Electrical Resistance

Implementation Method 2

a flow path unit in which the chemical solution introduced through the inlet is moved while a velocity of its fluid is changed

Methodology Applied
Scientific EffectFluid flow velocity change:

Data Source

PatentUS12500096B2Apparatus for inspecting droplet and substrate processing apparatus including the same
Publication Date: 2025.12.16 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US12500096B2 patent drawing
  • US12500096B2 patent drawing
  • US12500096B2 patent drawing

AI summary

An apparatus for inspecting a chemical solution of the present invention comprises a base unit having an inlet, through which a chemical solution is introduced, a flow path unit, in which the chemical solution introduced through the inlet is moved while a velocity of its fluid is changed, and including a first region unit provided adjacent to the inlet of the base unit and a second region unit being in series communication with the first region unit, in which the chemical solution discharged from the first region unit is moved, a detecting unit including a first detecting member for detecting a first signal that is an electrical signal of the first region unit, and a second detecting member for detecting a second signal that is an electrical signal of the second region unit, and a determining unit for receiving a signal from the detecting unit and determining that a particle and a bubble are detected if a current of the first signal and the second signal is changed compared to a reference value, and discriminating and determining a particle and a bubble according to a difference in a current between the first signal and the second signal or a time difference, in which a current is changed.