Cholate Photoacid Generators for Submicron Imaging Resolution
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Solution Overview
Problem
Existing photoresists lack the capability to produce highly resolved images of submicron dimensions, which are necessary for advanced commercial applications, and there is a need for improved photoactive compounds to enhance their functional properties.
Innovation Solution
Development of novel photoacid generator compounds (PAGs) incorporating a cholate moiety, particularly sulfonium compounds with a fluorinated sulfonate anion, which enhance solubility and are used in positive-acting or negative-acting chemically amplified photoresists for submicron imaging, along with specific resin binders and photoacid-labile groups for improved resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photoresist compositions are used, then the existing commercial applications can be satisfied, but the capability to produce highly resolved images of submicron dimensions is insufficient
Solution Approach 1:
The patent modifies the chemical composition parameters of the photoresist by incorporating specific photoacid generator compounds (PAGs) with cholate moieties and fluorinated sulfonate anions. These parameter changes in composition enable the photoresist to achieve submicron resolution while maintaining reliable imaging performance across different wavelength ranges including EUV and sub-300 nm.
Solution Approach 2:
The invention creates a composite photoresist system by combining resin binders with specifically designed PAG compounds that have both cholate and fluorinated sulfonate groups. This composite approach integrates multiple functional components to simultaneously achieve high resolution and reliable imaging, overcoming the limitations of conventional single-component photoresist formulations.
2Manufacturing precision
If photoactive compounds are altered to improve functional properties, then imaging performance can be enhanced, but the complexity of the photoresist composition increases
Solution Approach 1:
The PAG compounds designed in this patent serve multiple functions simultaneously: they act as photoacid generators for chemically amplified imaging, provide enhanced solubility through their cholate moieties, and improve compatibility with various resin binders through their fluorinated sulfonate groups. This multi-functionality reduces the need for separate additives and simplifies the overall composition despite the advanced imaging performance achieved.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The novel PAGs and resin combinations enable the formation of highly resolved patterned images with sub-quarter micron dimensions, suitable for sub-300 nm and sub-200 nm wavelengths, including EUV, by enhancing solubility and imaging effectiveness in photoresist compositions.
Implementation Method 1
After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to form a latent image in the photoresist coating
Data Source
AI summary
New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.