Circuit Layout Modification for Accurate EM Simulation
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Solution Overview
Problem
Conventional electromagnetic (EM) simulators face challenges in performing accurate and efficient simulations due to the high complexity of circuit layouts, which can result in lengthy computation times and inaccuracies, as they often lack knowledge of the actual physical geometry resulting from fabrication processes.
Innovation Solution
A system and method that automatically modifies a circuit layout by applying sets of rules to generate a modified layout, which includes vertical electrical connections and simplifies the geometry, enabling accurate EM simulation. This involves a computer system configured to determine the targeted fabrication process and select appropriate rules from a library, modifying the layout to represent the actual three-dimensional geometry of the physical circuit.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional EM simulators are used to simulate complex circuit layouts, then simulation accuracy is limited, but computation time becomes excessively long
Solution Approach 1:
The patent segments the complex circuit layout into simplified geometric representations that capture essential electromagnetic characteristics while reducing computational complexity. The layout modification process divides the original complex geometry into manageable segments that can be simulated more efficiently.
Solution Approach 2:
The patent creates a simplified copy or representation of the original complex layout. By generating a modified layout that preserves key electromagnetic properties while using simpler geometric forms, the system achieves accurate simulation results without the computational burden of the original complex geometry.
2Manufacturing precision
If conventional EM simulators process detailed circuit layouts, then layout detail is preserved, but simulation efficiency decreases
Solution Approach 1:
The patent extracts only the essential geometric features from the detailed circuit layout that are necessary for accurate EM simulation. By removing unnecessary level of detail while preserving critical electromagnetic characteristics, the system improves simulation efficiency without sacrificing essential accuracy.
Solution Approach 2:
Instead of starting with detailed layout and simplifying, the patent inverts the approach by first creating a simplified geometric representation and then adding only the necessary details for accurate simulation. This reverse approach achieves both efficiency and accuracy.
3Measurement precision
If automatic layout modification is applied to add vertical connections, then simulation accuracy improves, but layout complexity increases
Solution Approach 1:
The patent performs preliminary actions by automatically adding necessary vertical connections and via structures to the layout before simulation. This preliminary modification ensures that all essential electromagnetic pathways are represented, improving simulation accuracy while the automation manages the complexity burden.
Solution Approach 2:
The layout modification system performs self-service by automatically analyzing the circuit design and adding necessary vertical connections without manual intervention. This automation handles the complexity of determining where via structures are needed, improving accuracy while reducing the practical burden of complexity management.
Data Source
AI summary
A system and method for automatically modifying a first layout of a circuit. The first layout may describe a plurality of layers used in a fabrication process to manufacture the circuit. When performed, the fabrication process may result in a vertical electrical connection between two of the layers. However, the vertical electrical connection may not be directly specified by the first layout. The system and method may operate to apply a set of rules to the first layout to automatically generate a modified layout directly specifying a vertical electrical connection between the two layers. The set of rules may be based on knowledge of the fabrication process, and may be designed to modify the geometry of the first layout to more closely model the real geometry of the circuit that will result from the fabrication process. The modified layout may enable an electromagnetic (EM) simulation of the circuit to be accurately performed.