Cleaning Agent Purification via Supercritical Distillation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
High density semiconductor devices often yield low results due to inadequate cleaning or the use of impure cleaning agents, which are also costly to purify effectively.
Innovation Solution
A method and apparatus for purifying cleaning agents involves heating a mixed solution containing an etching agent and a cleaning agent, distilling to remove a second cleaning agent, and then condensing to form a second mixed solution, which is further heated to extract the cleaning agent, utilizing a supercritical fluid like carbon dioxide and reflux control to achieve high purity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If pure cleaning agents are used, then cleaning quality and device reliability are improved, but cost increases
Solution Approach 1:
The patent recovers and reuses cleaning agents through distillation and separation processes. The cleaning agent is purified by removing contaminants and byproducts, then reused in subsequent cleaning operations, reducing the need for continuous purchase of fresh pure cleaning agents while maintaining cleaning quality and device reliability
Solution Approach 2:
The patent changes the physical parameters (temperature, pressure) of the cleaning agent system to enable separation and purification. By controlling temperature and pressure during distillation, the cleaning agent is separated from contaminants and byproducts, allowing recovery of pure cleaning agent for reuse, thus reducing cost while maintaining reliability
2Productivity
If distillation is performed at high temperature, then separation efficiency is improved, but energy consumption increases
Solution Approach 1:
The patent utilizes phase transitions (liquid to vapor and back to liquid) during distillation to achieve separation. By controlling temperature and pressure to induce phase changes, the cleaning agent and contaminants are separated based on their different volatility characteristics, improving separation efficiency while managing energy consumption through controlled phase transition cycles
Solution Approach 2:
The distillation process operates in periodic cycles of heating, vaporization, condensation, and collection. This periodic action allows efficient separation to be achieved in discrete stages, optimizing energy utilization by concentrating heating energy only when needed for phase transition, rather than continuous high-energy input
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method and apparatus effectively purify cleaning agents, reducing impurities and costs by using a multi-step distillation process with supercritical fluids, enhancing the yield and reliability of semiconductor devices.
Implementation Method 1
heating a first mixed solution including an etching agent, a first cleaning agent, and a second cleaning agent at or below a first temperature and distilling the etching agent and the first cleaning agent
Implementation Method 2
condensing or compressing the etching agent and the first cleaning agent forming a second mixed solution
Implementation Method 3
heating the second mixed solution at a temperature lower than a second temperature, redistilling the etching agent and extracting the first cleaning agent
Implementation Method 4
The first cleaning agent may include a supercritical fluid. The supercritical fluid may include carbon dioxide
Data Source
AI summary
A method of purifying a cleaning agent is provided. The method includes heating a first mixed solution including an etching agent, a first cleaning agent, and a second cleaning agent at or below a first temperature and distilling the etching agent and the first cleaning agent and removing the second cleaning agent. The method includes condensing or compressing the etching agent and the first cleaning agent forming a second mixed solution including the etching agent and the first cleaning agent. The method includes heating the second mixed solution at a temperature lower than a second temperature, redistilling the etching agent and extracting the first cleaning agent. The second temperature is lower than the first temperature.