Detergent Mixture Composition Preparation TRIZ Cases
- Copolymer Fiber Neutralization via Aqueous Ammonia
Aqueous ammonia neutralizes sulfuric acid in copolymer fibers, resolving poor hydrolytic stability caused by imidazole functionality.
- Cleaning Agent for Plasma Residue Removal
A cleaning agent removes plasma residues using diluted hydrofluoric acid and an acid solution.
- Ammonia-Activated Siloxane Rinse for Sub-50nm Pattern Collapse
Non-aqueous ammonia-activated siloxane composition protects high aspect ratio structures during chemical rinse and spin dry processes.
- Silicon Concentration Measurement in Phosphoric Acid Etching
Branch pipe extraction with potentiometry measures silicon concentration in phosphoric acid, preventing deposition from temperature drops.
- Supercritical CO2 Drying for High Aspect Ratio Features
Small thermal mass chambers transition cleaning fluid to supercritical CO2, eliminating capillary forces that cause line stiction in high aspect ratio features.
- Photoresist Stripper Composition Preventing Potassium Carbonate Precipitation
A photoresist stripper composition uses glycol ether solvents and amines to remove polymer resist layers from substrates.
- Poly Alpha Glucan Derivative for Laundry Care
A poly alpha glucan derivative with specific glycosidic linkages acts as a rheology modifier and emulsion stabilizer.
- Cleaning Liquid for Metal Resist Substrates
A cleaning liquid containing a solvent, organic acid, and chelating compound removes metal residues from substrates.