CMP Cover Assembly Fluid Chamber Gap Cleaning
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Solution Overview
Problem
In chemical mechanical polishing (CMP) processes, polishing liquid adheres to the polishing head and cover assembly, leading to dried particles that cause scratches on substrates due to gaps between the head and cover, which are not effectively addressed by existing solutions.
Innovation Solution
A cover assembly with a cover cleaning part that includes an outer and inner cover part, a fluid chamber, and cleaning liquid supply and discharge ports to prevent polishing liquid adhesion by continuously supplying a cleaning liquid to the gap between the rotating body and the cover assembly, preventing particle formation and substrate scratches.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a cover is attached to the polishing head to prevent polishing liquid adhesion, then polishing liquid adhesion is reduced, but a gap remains between the polishing head and cover allowing polishing liquid to adhere and form particles
Solution Approach 1:
A cleaning liquid is introduced as an intermediary substance to fill the gap between the polishing head and cover assembly. The cleaning liquid continuously supplied through the fluid chamber and discharge port prevents polishing liquid from adhering to the gap surfaces, effectively mediating the interaction between the polishing liquid and the gap region.
Solution Approach 2:
The cleaning liquid supply system operates continuously during polishing operations. The cleaning liquid is constantly supplied through the cleaning liquid supply port, flows through the fluid chamber, and discharges continuously through the discharge port to maintain continuous cleaning action in the gap region, preventing particle formation over time.
2Ease of manufacture
If the cover assembly structure is simplified, then manufacturing is easier, but the cleaning function in the gap region is insufficient
Solution Approach 1:
The cover assembly is segmented into distinct functional components: an outer cover part, an inner cover part, and a fluid chamber. This segmentation allows each component to be optimized independently - the outer and inner cover parts can be manufactured separately and assembled, while the fluid chamber provides a dedicated space for cleaning liquid circulation, achieving both manufacturability and effective cleaning function.
Solution Approach 2:
The fluid chamber serves as an intermediary structure that facilitates cleaning liquid flow from the supply port to the discharge port. This intermediate fluid passage enables effective gap cleaning without requiring complex direct spray mechanisms, maintaining structural simplicity while achieving the cleaning function.
3Object-affected harmful factors
If cleaning liquid is supplied continuously to prevent polishing liquid adhesion, then particle formation is prevented, but cleaning liquid consumption increases
Solution Approach 1:
The system maintains continuous cleaning action through uninterrupted cleaning liquid supply, which is necessary to prevent polishing liquid adhesion and particle formation throughout the polishing process. The continuous flow ensures that the gap region remains constantly clean, justifying the ongoing liquid consumption.
Solution Approach 2:
The fluid chamber acts as a reservoir and distribution intermediary, storing and directing cleaning liquid flow efficiently. This intermediary structure optimizes liquid utilization by ensuring clean liquid reaches the gap region where it is most needed, reducing waste from inefficient distribution patterns.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The cover assembly effectively prevents polishing liquid adhesion and subsequent particle formation, thereby preventing scratches on substrates during CMP processes by ensuring continuous cleaning of the rotating body and cover assembly surfaces.
Implementation Method 1
a cleaning liquid supply port, provided in the outer cover part or the inner cover part, communicating with the fluid chamber, and for supplying a cleaning liquid to the fluid chamber. The inner cover part includes at least one cleaning liquid discharge port communicating with the fluid chamber and facing the outer peripheral surface of the rotating body
Data Source
AI summary
A cover assembly includes a cover cleaning part covering at least a portion of an outer peripheral surface of a rotating body. The cover cleaning part includes: an outer cover part, constituting an outer surface of the cover cleaning part; an inner cover part, constituting at least a portion of an inner surface of the cover cleaning part; a fluid chamber, formed between the outer cover part and the inner cover part; and a cleaning liquid supply port, provided in the outer cover part or the inner cover part, communicating with the fluid chamber, and for supplying a cleaning liquid to the fluid chamber. The inner cover part includes at least one cleaning liquid discharge port communicating with the fluid chamber and facing the outer peripheral surface of the rotating body.