CMP Dressing Device Flow Passage Design for Sealless Maintenance

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Solution Overview

Problem

Existing CMP polishing apparatuses face issues with maintenance frequency due to contact seal deterioration and inefficient removal of polishing liquid and debris, leading to suboptimal control of pressing force and dressing efficiency.

Innovation Solution

A dressing device with a disk, rotatable holder, and housing featuring flow passages for supplying and suctioning process liquid without a contact seal, allowing for smooth control of pressing force and enhanced removal of polishing liquid and debris, utilizing a labyrinth structure and detachable components for reduced maintenance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a hollow rotation shaft with a contact seal is used in the dresser, then the structure is simple, but the contact seal deteriorates due to polishing liquid, increasing maintenance frequency

Engineering Contradiction:
Improvestructure simplicityVSAvoidcontact seal durability
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent extracts the contact seal from the system by using a through-hole structure instead of a hollow rotation shaft with sealing. The process liquid flows freely through the hole without requiring seals, eliminating the reliability issue while maintaining structural simplicity.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent segments the flow path into multiple sections: supply port on the cover, through-hole in the rotation shaft, and suction port on the dresser. This segmentation allows process liquid to flow through discrete sections without requiring seals between rotating and stationary parts.

Inventive Principle:
Principle #1Segmentation

2Ease of operation

If a rotary joint is disposed on the rotation shaft to avoid hose tangling, then the hose tangling problem is solved, but a cylinder cannot be disposed to generate pressing force, causing load offset and increased sliding resistance

Engineering Contradiction:
Improvehose managementVSAvoidpressing force control
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The patent removes the rotary joint from the system by using a through-hole structure. The holder rotates on the rotation shaft without requiring rotary joints, as the process liquid flows through the hole rather than through sealed connections that would require rotary joints.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

Instead of making the rotation shaft hollow to allow hose passage, the patent inverts the approach by making the rotation shaft solid with a through-hole. This allows the holder to rotate freely while the process liquid flows through the stationary hole, eliminating the need for rotary joints while maintaining pressing force control capability.

Inventive Principle:
Principle #13The other way round (Inversion)

3Device complexity

If the suction port is provided on the outer circumference side of the dresser, then the structure is simple, but polishing liquid and debris near the center cannot be sufficiently removed

Engineering Contradiction:
Improvesuction port configurationVSAvoidpolishing liquid removal efficiency
Core Design Contradiction:
Device complexityVSProductivity

Solution Approach 1:

The patent introduces the rotation shaft as an intermediary structure with a through-hole that extends through the center of the dresser. This allows process liquid to be supplied and suctioned directly at the center location, enabling effective removal of polishing liquid and debris from the central region while maintaining structural simplicity.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Reduces maintenance frequency, improves dressing efficiency by ensuring stable supply and suction of process liquid, and effectively removes debris and polishing liquid, enhancing the overall polishing performance.

Implementation Method 1

a first flow passage that passes from a lower surface to an upper surface... a second flow passage in an interior... the process liquid is supplied from the supply source to the polishing surface, through the second flow passage and the first flow passage in order, and the process liquid on the polishing surface is sucked by the suction source

Methodology Applied
Scientific EffectPressure differential flow: Pressure Gradient

Data Source

PatentUS10777417B2Dressing device, polishing apparatus, holder, housing and dressing method
Publication Date: 2020.09.15 EBARA CORP
  • US10777417B2 patent drawing
  • US10777417B2 patent drawing
  • US10777417B2 patent drawing

AI summary

A dressing device including: a disk that has an opening on an inside, the disk dressing a polishing surface for polishing a substrate; a rotatable holder, the disk being coupled to a lower surface side of the holder, the holder being provided with a first flow passage that passes from a lower surface to an upper surface, the lower surface being inside an outer edge of the opening of the disk; and a housing that is provided with a distance from the upper surface of the holder, the housing being provided with a second flow passage in an interior, the housing being fixed such that an opening of the second flow passage faces the upper surface of the holder, the second flow passage being connected with a supply source and a suction source of process liquid.