Coating System With Isolation Shield For Versatile Pe-CVD
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Solution Overview
Problem
Existing coating systems, particularly cathodic arc deposition systems, are limited in versatility and high in capital expenses, making them suitable for only a few applications, whereas there is a need for systems capable of operating in multiple modes such as sputtering, cathodic arc deposition, and their combination.
Innovation Solution
A coating system with a central plasma source, rotatable substrate holder, and multiple isolation shields, including a negatively charged first isolation shield and a remote anode, allowing for versatile operations like plasma enhanced magnetron sputtering, cathodic arc deposition, and ion cleaning by creating a hollow cathode plasma environment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a cathodic arc deposition system is used, then highly ionized plasma and electron beam are generated for reliable coating deposition, but the system is limited to only one or a few applications and has high capital expenses
Solution Approach 1:
The patent applies universality by designing a single cathodic arc deposition system that can perform multiple applications including sputtering only, cathodic arc deposition only, and simultaneous sputtering plus cathodic arc deposition. The system achieves this through configurable target arrangements and process parameters that enable different deposition modes without requiring separate equipment for each application.
2Reliability
If a cathodic arc deposition system is used, then highly ionized plasma is generated for coating deposition, but the capital expenses are relatively high
Solution Approach 1:
The patent reduces capital expenses by creating a multi-functional system that can perform sputtering, cathodic arc deposition, and hybrid modes using the same equipment. This eliminates the need for separate coating systems for different applications, thereby reducing overall capital investment while maintaining reliable coating deposition capabilities.
3Productivity
If a coating system is designed for high volume PE-CVD processing, then processing efficiency is improved, but the system complexity increases
Solution Approach 1:
The patent manages system complexity in high volume PE-CVD processing through segmentation of the coating chamber into multiple independent coating heads or zones. Each zone can process substrates simultaneously or independently, increasing overall productivity while maintaining manageable complexity through modular design that allows individual zone optimization and maintenance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enhances electron density and temperature within the deposition area, enabling multiple application modes such as plasma enhanced magnetron sputtering, cathodic arc deposition, and ion cleaning, increasing the versatility and efficiency of the coating process.
Implementation Method 1
a first isolation shield positioned about the chamber center at a second distance from the chamber center, the first isolation shield is, in use, negatively charged
Implementation Method 2
creating a hollow cathode plasma environment
Implementation Method 3
cathodic arc deposition (i.e., a type of physical deposition) has become established as a reliable source of highly ionized plasma for deposition of reacted as well as un-reacted coatings
Implementation Method 4
In a typical cathodic arc coating process, an electric arc vaporizes material from a cathode target
Implementation Method 5
Physical vapor deposition (PVD) and low pressure chemical vapor deposition (CVD) sources are used for deposition of coatings and surface treatment
Implementation Method 6
The vaporized material then condenses on a substrate to form a coating
Implementation Method 7
the plasma constituents are selected, controlled and directed toward the substrate by electromagnetic fields generated by at least a first anode, surrounding the cathode
Data Source
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AI summary
A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.