Common Electrode Slits for Uniform Developing Solution in TFT-LCD

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Solution Overview

Problem

Conventional TFT-LCD manufacturing processes, particularly the four-mask process for FFS type TFT-LCDs, face challenges with non-uniform developing solution concentration near driving circuits, leading to cloudy Mura and increased difficulty in etching, which affects the yield and quality of array substrates.

Innovation Solution

Incorporating slits in the common electrode driving interface pattern and increasing the distance between the driving circuit and pixel regions to ensure uniform developing solution concentration, achieved through specific photolithography processes and mask designs, reduces the occurrence of cloudy Mura and improves substrate quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the common electrode driving interface pattern is formed without slits in the conventional four-mask process, then the manufacturing process is simpler and faster, but the developing solution concentration becomes non-uniform near driving circuits, causing cloudy Mura and reducing substrate quality

Engineering Contradiction:
Improvemanufacturing process speedVSAvoiduniformity of developing solution concentration
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The common electrode driving interface pattern is segmented by introducing slits that divide it into multiple portions. This segmentation allows the developing solution to flow more uniformly through the pattern during photolithography, preventing the concentration non-uniformity that causes cloudy Mura while maintaining the driving circuit's functionality.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Slits are strategically introduced only in the common electrode driving interface pattern where concentration non-uniformity occurs, rather than modifying the entire substrate or all patterns. This localized modification maintains uniform developing solution concentration specifically in the problematic regions without affecting other areas of the substrate.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If the distance between driving circuit and pixel regions is increased to ensure uniform developing solution concentration, then cloudy Mura is reduced, but the substrate area increases and pixel density decreases

Engineering Contradiction:
Improveuniformity of photoresist thicknessVSAvoidsubstrate area
Core Design Contradiction:
Manufacturing precisionVSArea of stationary object

Solution Approach 1:

Instead of increasing the distance between driving circuit and pixel regions, the invention segments the common electrode driving interface pattern with slits. This allows uniform developing solution concentration to be achieved within the existing substrate area, maintaining both manufacturing precision and area efficiency.

Inventive Principle:
Principle #1Segmentation

3Manufacturing precision

If slits are introduced in the common electrode driving interface pattern, then uniform developing solution concentration is achieved and cloudy Mura is alleviated, but the pattern complexity increases

Engineering Contradiction:
Improveuniformity of developing solution concentrationVSAvoidpattern structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The common electrode driving interface pattern is divided into multiple portions by slits, which simplifies the flow of developing solution and eliminates cloudy Mura. The segmentation adds structural elements but resolves the concentration uniformity issue more effectively than alternative approaches.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Slits are introduced only in the common electrode driving interface pattern where concentration non-uniformity occurs, rather than modifying the entire substrate or all patterns. This localized modification maintains uniform developing solution concentration specifically in the problematic regions without affecting other areas of the substrate.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS9274388B2Array substrate having common electrode driving interface pattern with slits, and manufacturing method thereof, and liquid crystal display
Publication Date: 2016.03.01 BOE TECHNOLOGY GROUP CO LTD
  • US9274388B2 patent drawing
  • US9274388B2 patent drawing
  • US9274388B2 patent drawing

AI summary

The embodiments of the disclosed technology provide an array substrate and manufacturing method thereof, and liquid crystal display. The array substrate comprises a base substrate comprising a pixel region and a driving circuit region. The driving circuit region formed on the base substrate comprises a common electrode driving interface pattern, and a gate driving interface pattern and a data line driving interface pattern, which are connected with the common electrode driving interface pattern, and the common electrode driving interface pattern comprises slits therein and the portions of the common electrode driving interface pattern divided by the slits are connected with one another.