Patterned Conductive Layer Layout for Pixel Repair and Low Leakage
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Solution Overview
Problem
Existing display devices face challenges in achieving precise pattern accuracy for conductive layers, leading to reduced success rates in repairing defective pixels and increased leakage currents, which affect display quality.
Innovation Solution
The display device incorporates a conductive layer design with specific width and shape configurations for the data line and connecting member, including a first data line portion with a greater width than the second, and a connecting member with varying widths, ensuring that the connecting portion does not overlap the gate line or electrode, and using a photomask with corner patterns for optical proximity correction during the photolithography process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the data line and connecting member are designed with uniform width, then the manufacturing process is simpler, but the pattern accuracy deteriorates and leakage current increases
Solution Approach 1:
The conductive layer is designed with non-uniform width where different sections serve different functions: the first data line portion has a first width optimized for signal transmission, while the second data line portion has a second width optimized for preventing leakage current. The connecting member similarly has varying widths to prevent overlap with the gate electrode and maintain pattern accuracy in critical areas.
Solution Approach 2:
The data line is divided into multiple segments (first data line portion and second data line portion) with different width characteristics. The connecting member is also segmented into multiple portions with different widths. This segmentation allows each segment to be optimized for its specific function while maintaining overall manufacturing feasibility.
2Reliability
If the connecting portion overlaps the gate line or gate electrode, then the conductive path is more direct, but the leakage current increases and pattern accuracy deteriorates
Solution Approach 1:
The connecting member acts as an intermediary element that bridges the data line and source electrode without directly overlapping the gate electrode. It provides an indirect but reliable conductive path that prevents leakage current while maintaining electrical connectivity through careful spatial arrangement.
Solution Approach 2:
The design resolves the overlap issue by utilizing the planar dimension rather than allowing vertical stacking. The connecting member is positioned in the planar layout to connect the data line to the source electrode while maintaining sufficient spacing from the gate electrode, effectively using spatial arrangement to prevent leakage current.
3Productivity
If the semiconductor layer protrudes beyond the conductive layer boundary, then the channel region is larger, but the leakage current increases
Solution Approach 1:
The conductive layer is designed with extended portions that protrude beyond the gate electrode boundaries in advance, creating a buffer zone. This preliminary extension ensures that the semiconductor layer can be properly contained within the desired region during subsequent processing steps, preventing unwanted protrusions that would cause leakage current while maintaining adequate channel region area.
4Manufacturing precision
If the photomask does not include corner patterns, then the manufacturing process is simpler, but the pattern accuracy deteriorates due to optical proximity effects
Solution Approach 1:
The photomask is designed with corner patterns that modify the optical parameters during exposure. These corner patterns compensate for optical proximity effects by changing the light distribution parameters, ensuring that the developed pattern accurately reflects the intended design geometry even in critical corner regions where optical distortion is most severe.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances pattern accuracy, improves the success rate of pixel repair, and reduces leakage currents by maintaining sufficient space for laser irradiation and preventing undesirable protrusions of the semiconductor layer, thereby enhancing display quality.
Implementation Method 1
using a photomask with corner patterns for optical proximity correction during the photolithography process
Implementation Method 2
maintaining sufficient space for laser irradiation
Data Source
AI summary
A display device includes: a gate line including a gate line portion; a data line; a transistor including a gate electrode connected to the gate line, a source electrode connected to the data line, and a drain electrode; and a connecting member disposed between the data line and the source electrode, connected to the data line and the source electrode to cross a gate electrode edge of the gate electrode. A connecting portion where a data line edge and a connecting member edge are connected to each other does not overlap the gate line and the gate electrode in a plan view. The data line includes a first data line portion crossing the gate line and a second data line portion connected to the first data line portion and does not overlap the gate line in the plan view.


