Conductive-Layer Mask Sheet Patterning for Uniform Display Deposition
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Solution Overview
Problem
Existing methods for manufacturing large display apparatuses using large area masks result in decreased deposition uniformity.
Innovation Solution
A method involving the formation of a mask with a conductive layer having a specific thickness and mesh or isolated pattern, fixed to a frame, is used to enhance deposition uniformity by etching organic and conductive material layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a large area mask is used for large display apparatuses, then the mask coverage area is increased, but deposition uniformity is lowered
Solution Approach 1:
The mask structure is segmented into multiple functional layers (mask substrate, organic material layer, conductive material layer) with the conductive layer forming a mesh or isolated pattern that divides the mask area into multiple zones, allowing each zone to maintain independent deposition characteristics while covering a large overall area
Solution Approach 2:
The conductive layer is configured with spatially varying properties (mesh or isolated pattern) where different regions have different electrical characteristics, creating local electric fields that compensate for deposition non-uniformity across the large mask area, with each local region optimized for its specific deposition requirements
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method improves deposition uniformity by ensuring precise patterning and consistent material application on large display apparatuses.
Implementation Method 1
The conductive layer may be fixed to the frame by electrostatic force
Implementation Method 2
the etching may include a dry etching process
Implementation Method 3
a variety of layers are formed through a method such as deposition
Data Source
AI summary
A method of manufacturing a mask, includes forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer, etching the organic material layer to form a mask sheet including through holes, removing the hard mask on the mask sheet, forming a conductive material layer on the mask sheet, and etching the conductive material layer to form a conductive layer.