Context Simulation for Early Pattern-Dependent IC Design
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Solution Overview
Problem
Existing methods for designing integrated circuits are limited by the need to use pattern-dependent manufacturing models only in later stages of the design process, which restricts the ability to address variations in feature dimensions and topography effectively, leading to issues like timing failures and increased power consumption due to variations in IC fabrication.
Innovation Solution
The approach involves generating pattern-dependent models by simulating different contexts and locations for design blocks or cells within the IC layout, allowing for early-stage extraction of manufacturing effects and integration into the design process to minimize variations and improve manufacturability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If pattern-dependent manufacturing models are used only in later stages of the design process, then the design process can proceed more quickly in early stages, but variations in feature dimensions and topography cannot be effectively addressed, leading to timing failures and increased power consumption
Solution Approach 1:
The patent applies preliminary action by extracting and analyzing manufacturing effects during early design stages rather than waiting for later stages. Context simulation is performed on individual blocks and cells before final integration, allowing design variations to be identified and corrected early in the design process, thus preventing timing failures and power consumption issues while maintaining overall design timeline efficiency
2Manufacturing precision
If context simulation is performed on individual blocks and cells in early design stages, then variations in feature dimensions can be predicted and reduced, but additional computational effort and analysis time are required
Solution Approach 1:
The patent applies segmentation by dividing the IC design into individual blocks and cells that can be analyzed separately through context simulation. Each block is extracted and simulated in isolation with different contextual environments, allowing manufacturing effects to be studied independently. This segmented approach manages complexity by breaking down the overall design analysis into smaller, more manageable units while still capturing the cumulative manufacturing variations when blocks are integrated
3Measurement precision
If multiple contexts and locations are simulated for each design block, then pattern-dependent manufacturing effects can be extracted more accurately, but the computational resources and processing time increase
Solution Approach 1:
The patent applies partial action by selecting representative contexts and locations for simulation rather than exhaustively simulating all possible scenarios. Multiple contexts are simulated to capture the range of manufacturing variations, but the approach focuses on extracting the most significant pattern-dependent effects rather than achieving complete exhaustive analysis. This balances accuracy with productivity by performing sufficient simulation to capture critical manufacturing effects without unnecessary computational overhead
Data Source
AI summary
A method, system, and computer program product are disclosed for using pattern-dependent models at early stages of the design process. This addresses the key disadvantage of prior approaches which are restricted to using such models later in the design process for IC designs that are nearly complete. Pattern-dependent manufacturing effects are extracted from early stage designs and using the extracted pattern-dependent effects to efficiently and effectively design the integrated circuit. One or more contexts are built around one or more units of the design, with examples of units being a block or cell. The units are then used in the context to generate pattern-dependent data as a basis for one or more pattern-dependent models.