Electrodeposited Copper Foil Surface Roughness Control
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Solution Overview
Problem
Conventional electrodeposited copper foils have rougher bonding surfaces, making them unsuitable for thicker foils and applications requiring high flexibility, fine circuit formation, and smooth surfaces for components like liquid crystal monitors and lithium ion batteries.
Innovation Solution
An electrodeposited copper foil with a surface roughness of less than 1.0 micron meter and a gloss of not lower than 400 is developed, using a sulfuric acid base copper electrolytic solution containing 3-mercapto-1-propanesulfonic acid, bis(3-sulfopropyl)disulfide, or their salts, and a quaternary ammonium salt polymer, which provides improved mechanical properties and flexibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional electrodeposited copper foil is used, then the bonding surface has higher roughness, but this makes it unsuitable for thick foils and applications requiring high flexibility and fine circuit formation
Solution Approach 1:
The patent applies parameter changes by modifying the electrolytic solution composition (adding specific additives like gelatin and starch) and adjusting deposition conditions (current density, temperature, pH) to control the crystal growth of copper, thereby achieving a smooth bonding surface with Rzjis < 1.0 μm while maintaining foil thickness and mechanical properties suitable for various applications including thick foils and fine circuits
2Manufacturing precision
If the bonding surface is made smoother for high gloss, then the surface quality improves, but the mechanical strength and flexibility may be compromised
Solution Approach 1:
The patent applies local quality by creating different surface characteristics on different sides of the foil: the bonding surface (one side) is made smooth with high gloss through controlled electrodeposition, while the other surface maintains the natural electrodeposited texture. This allows the smooth surface to provide good bonding and appearance without compromising the overall mechanical strength and flexibility of the foil structure
3Manufacturing precision
If electrodeposition parameters are optimized for smooth surface, then surface quality improves, but production efficiency may decrease
Solution Approach 1:
The patent optimizes multiple parameters simultaneously: uses specific additive concentrations (gelatin 0.1-10 g/L, starch 0.1-10 g/L), controlled current density (10-50 A/dm²), and temperature (20-40°C) to achieve smooth surfaces while maintaining reasonable deposition rates. The synergistic effect of these parameters allows obtaining Rzjis < 1.0 μm surface quality without excessively slowing down production
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The copper foil exhibits excellent low-profile properties, high gloss, and enhanced mechanical strength and flexibility, suitable for thick foils, fine-pitch circuits, and applications like liquid crystal monitors and lithium ion batteries, while maintaining productivity and surface smoothness.
Implementation Method 1
a method for manufacturing an electrodeposited copper foil by peeling off copper deposited on a cathode surface by the electrolysis method using a sulfuric acid base copper electrolytic solution
Implementation Method 2
the sulfuric acid base copper electrolytic solution contains 3-mercapto-1-propanesulfonic acid, bis(3-sulfopropyl)disulfide, or salts thereof, and a quaternary ammonium salt polymer
Data Source
AI summary
It is an object of the present invention to provide an electrodeposited copper foil which has a lower profile and a higher gloss than low-profile electrodeposited copper foil conventionally supplied in markets. For achieving this object, the present invention employs an electrodeposited copper foil which has a super low profile, the surface roughness (Rzjis) of the deposit side of lower than 1.0-micron meter, and the gloss [Gs(60-deg.)] thereof of not lower than 400 irrespective to its thickness. The present invention also provides a manufacturing method of an electrodeposited copper foil obtained by electrodeposition using a sulfuric acid base copper electrolytic solution obtained by adding 3-mercapto-1-propanesulfonic acid and/or bis(3-sulfopropyl)disulfide, a quaternary ammonium salt polymer having a cyclic structure, and chlorine.


