Curved Substrate Chuck for Laser Stealth Dicing

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Mechanical cutting of semiconductor substrates often results in defects such as chipping, and existing laser cutting methods may cause physical damage to semiconductor chips due to high power requirements and scattering issues.

Innovation Solution

A substrate processing apparatus using a chuck table with a curved mounting surface that vacuum-adsorbs the substrate to modify its shape and a laser supply head that focuses a laser beam to create a modification layer, allowing for stealth dicing by propagating cracks within the substrate without damaging integrated circuit regions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If mechanical cutting using a sawing blade is used, then the substrate can be cut, but defects such as chipping occur in the semiconductor chip

Engineering Contradiction:
Improvecutting capabilityVSAvoidchip integrity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent replaces the mechanical sawing blade cutting system with a laser beam-based cutting system. The laser beam irradiates the substrate to form a modification layer that propagates cracks along the cutting line, separating the substrate without mechanical contact. This substitution eliminates the chipping defects caused by mechanical blade contact while maintaining effective cutting capability.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Productivity

If high power laser beam is used for cutting, then the substrate can be cut, but physical damage occurs to the semiconductor chip

Engineering Contradiction:
Improvecutting efficiencyVSAvoidphysical damage to chip
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent applies local quality by creating a modification layer only at the specific location where the laser beam irradiates the substrate, rather than applying high power uniformly across the entire substrate. The modification layer forms localized cracks along the cutting line, enabling cutting with lower overall laser power and preventing widespread physical damage to the semiconductor chip.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes the laser beam parameters by using a wavelength that the substrate material absorbs effectively, allowing cutting to be achieved with lower power. The modification layer formation process alters the local physical properties of the substrate, enabling crack propagation at reduced energy levels compared to traditional high-power laser cutting methods.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If laser beam is used for cutting, then physical damage is reduced, but the laser power required is high

Engineering Contradiction:
Improvechip integrityVSAvoidlaser power consumption
Core Design Contradiction:
Manufacturing precisionVSUse of energy by moving object

Solution Approach 1:

The patent changes the laser beam parameters by selecting a wavelength that matches the absorption characteristics of the substrate material. This parameter optimization allows the laser to be absorbed more efficiently by the substrate, forming the modification layer with lower power requirements. The wavelength selection enables reduced energy consumption while maintaining the chip integrity benefits of laser cutting.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method reduces the risk of chipping and physical damage by using a low-power laser to form cracks in the substrate, enhancing productivity and reducing the number of cutting operations while maintaining chip integrity.

Implementation Method 1

the substrate is vacuum adsorbed on the mounting surface so that the substrate is modified to have a curvature corresponding to a curvature of the mounting surface

Methodology Applied
Scientific EffectVacuum pressure: Vacuum

Implementation Method 2

a laser supply head configured to irradiate the substrate mounted on the mounting table with a laser beam

Methodology Applied
Scientific EffectLaser beam irradiation: Laser

Implementation Method 3

the laser supply head irradiates a focusing point in the substrate modified by the chuck table with the laser beam

Methodology Applied
Scientific EffectLaser focusing: Focusing

Data Source

PatentUS20230082384A1Substrate processing apparatus and method of manufacturing semiconductor chip using the same
Publication Date: 2023.03.16 SAMSUNG ELECTRONICS CO LTD
  • US20230082384A1 patent drawing
  • US20230082384A1 patent drawing
  • US20230082384A1 patent drawing

AI summary

A substrate processing apparatus includes a chuck table including a mounting table having a mounting surface on which a substrate is mounted, wherein the mounting surface is a curved surface; and a laser supply head configured to irradiate the substrate attached to the mounting table with a laser beam.