Cyclic-Solvent Thinner Composition for Photoresist EBR
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Solution Overview
Problem
Existing thinner compositions for semiconductor manufacturing cause issues such as high Hump height, reduced film uniformity, and increased defects due to high polarity, leading to reduced yield and efficiency in removing photosensitive films and anti-reflective coatings.
Innovation Solution
A thinner composition comprising a cyclic ketone-based compound and a cyclic hydrocarbon compound, which controls polarity and improves solubility and Edge Bead Removal (EBR) properties for KrF, ArF, and EUV photoresists and anti-reflective coatings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If high polarity thinner composition is used to improve solubility and EBR properties, then dissolution rate and EBR performance are improved, but Hump height increases and film uniformity decreases
Solution Approach 1:
The patent changes the chemical composition parameters of the thinner by using a specific mixture ratio of PGMEA (70-90 wt%), EB (5-20 wt%), and OPG (1-10 wt%). This parameter optimization balances the polarity to achieve both high EBR performance and low Hump height, resolving the contradiction between dissolution rate and film uniformity
Solution Approach 2:
The patent creates a composite thinner composition by combining three different solvents (PGMEA, EB, and OPG) with complementary properties. PGMEA provides base solubility, EB enhances EBR performance, and OPG controls swelling rate, achieving both high EBR performance and low Hump height simultaneously
2Productivity
If high polarity thinner composition is used to improve dissolution rate, then photosensitive resin removal efficiency is improved, but photoresist swelling speed increases causing higher Hump height
Solution Approach 1:
The patent optimizes the composition parameters to contain OPG at 1-10 wt% which specifically controls the swelling rate of photoresist. This parameter adjustment maintains high dissolution rate through PGMEA while the OPG component moderates the swelling speed to prevent excessive Hump formation
Solution Approach 2:
The patent introduces OPG as an intermediary substance that mediates between the strong dissolving power of PGMEA and the photoresist material. OPG acts as a buffer that enables efficient dissolution while controlling the swelling kinetics, preventing rapid swelling that would cause high Hump height
3Manufacturing precision
If rotation speed is reduced to low rpm due to substrate diameter enlargement, then coating uniformity is improved, but photosensitive film removal efficiency decreases
Solution Approach 1:
The patent changes the chemical parameters of the thinner composition to enhance its removal capability. The optimized mixture of PGMEA, EB, and OPG provides superior dissolution power that compensates for the reduced mechanical action from low rotation speeds, maintaining both coating uniformity and removal efficiency
4Ease of operation
If high polarity thinner is used to improve EBR properties, then edge bead removal is enhanced, but film uniformity across the substrate decreases
Solution Approach 1:
The patent precisely adjusts the polarity parameters by controlling the ratio of polar components (EB and OPG) to non-polar components (PGMEA). This parameter optimization ensures sufficient polarity for effective EBR while preventing excessive polarity that would cause non-uniform film formation, achieving both ease of operation and manufacturing precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively reduces Hump height, enhances film uniformity, and improves yield by controlling the swelling speed of photoresists, thereby minimizing defects in subsequent processes.
Implementation Method 1
A thinner composition comprising a cyclic ketone-based compound and a cyclic hydrocarbon compound, which controls polarity and improves solubility and Edge Bead Removal (EBR) properties
Data Source
AI summary
The present disclosure provides a thinner composition including a cyclic ketone-based compound and a cyclic hydrocarbon compound, and a method for removing a photosensitive resin and an anti-reflective coating using the same.