Non-Surface-Active Detergent Compositions TRIZ Cases
- Installation of floorcovering article on chemically abated flooring surface and composite article
See how a polymer barrier coating isolates residual abatement chemicals in concrete pores, prev
- Method of providing oil and/or grease resistant textile materials
See how blocky carboxymethyl cellulose coating replaces toxic fluorochemicals to resist oil and
- Alpha-Amylase Variants for Cold-Water Starch Stain Removal
Engineered alpha-amylase variants shift enzyme activity to 5-35°C, improving starch stain removal and wash stability in cold-water cleaning.
- Hydrocarbon Refrigerant Composition With Higher Ignition Stability
A mixed ethane-propane-butane refrigerant raises ignition temperature, avoids ozone harm, and also cleans precision components.
- Wash Cycle Bleach Activation With Metal Ion Recapture
Metal ions activate stable bleach during washing, then are captured before discharge to preserve cleaning power and limit environmental release.
- Semiconductor Processing Solution With Dissolved Oxygen Corrosion Control
Controlled dissolved oxygen and corrosion inhibitors let alkaline semiconductor cleaning remove resist residues while protecting Cu layers and Low-k materials.
- Plastic Crystalline Drying for High-Aspect-Ratio Substrate Patterns
A plastic crystalline drying layer sublimes without crystal grain boundaries, reducing stress and pattern collapse on fine substrate features.
- Semiconductor Thinner Composition for Uniform Photoresist Prewetting
A tailored thinner prewets semiconductor substrates to improve photoresist and underlayer uniformity while supporting efficient EBR and lower resist use.
- Light-Absorbing Release Layer for Wafer Support Separation
A light-absorbing siloxane release layer enables strong wafer support during polishing, then clean separation and residue removal after processing.
- Wafer Edge Rinse Composition for EPL and Hardmask Residue Removal
A combined acetic acid and anisole rinse removes wafer edge protection layers and residual hardmask metals in one step, cutting contamination and delay.
- Water Jet Peening in Shallow Baths Using Upward Cavitation
An upward water jet enables effective cavitation peening at shorter liquid-surface distances, so existing underwater washers can handle shallow-bath processing.
- Iron Sulfide Dissolution Composition for Low-Corrosion Wellbore Descaling
Biochelants and organophosphorus compounds dissolve iron sulfide scale in wellbores while reducing corrosion, toxic by-products, and productivity loss.
- Resist Film Rinsing Liquid for High-Resolution Patterning
A 7-carbon ester-based rinsing liquid lowers capillary effects during resist rinse, improving pattern resolution while suppressing film thickness loss.
- Metal-Containing Resist Development With Selective Solvent Cleaning
A lower-solubility cleaning solvent follows organic-solvent development to remove metal-containing resist residue and preserve precise patterns.
- Cyclic-Solvent Thinner Composition for Photoresist EBR
High-polarity thinners can raise Hump height and reduce uniformity; a cyclic ketone–hydrocarbon blend improves EBR and coating results.
- Thinner Composition for Photoresist EBR and Hump Height Control
An organic solvent with δh ≥ 10 and hydroxyalkylketone balance photoresist solubility, EBR, RRC, and coating uniformity.
- Metal-Film Cleaning Solution for Residue and Hump Suppression
An organic-acid cleaning solution balances metal-film residue removal, hump suppression, and waste-liquid stability.