De-Bubbling Slide for Viscous Fluid Bubble Removal
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Bubbles in viscous fluids used in semiconductor manufacturing, such as photoresist, disrupt the uniformity of the deposited film, leading to irregularities and potential damage to integrated circuits due to pattern disruptions and voids.
Innovation Solution
A fluid dispensing system with a de-bubbling slide that includes a receiving element and a slide path within a dispensing vessel, where the fluid flows to prolong contact time and allow bubbles to rise and burst, combined with a mechanism to evacuate gas, effectively removing bubbles and dissolved gases.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the fluid is pressurized to force it out of the storage vessel, then the fluid can be transferred to the dispensing vessel, but bubbles are formed in the fluid
Solution Approach 1:
The patent applies preliminary action by providing a bubble removal chamber before the dispensing nozzle where bubbles can rise and be removed from the fluid before deposition. The fluid is directed to flow across an inclined surface in the bubble removal chamber, allowing bubbles to separate and be evacuated through openings in the chamber wall, preventing bubbles from reaching the substrate.
2Manufacturing precision
If the fluid viscosity is high, then the fluid can maintain pattern fidelity, but bubbles are harder to remove from the fluid
Solution Approach 1:
The patent uses an intermediary inclined surface in the bubble removal chamber that facilitates bubble removal without requiring high fluid velocity. The inclined surface allows bubbles to rise and coalesce at the fluid-air interface, from where they can be removed through openings in the chamber wall, providing an effective bubble removal mechanism that works with viscous fluids.
3Productivity
If the fluid flow rate is increased to improve productivity, then more fluid can be deposited, but bubbles are less time to rise and burst
Solution Approach 1:
The patent introduces a spatial dimension by using an inclined surface that extends across the bubble removal chamber. This inclined geometry provides an extended path length for bubble separation in the horizontal direction, allowing sufficient bubble removal time even at higher flow rates. The bubbles rise vertically while the fluid flows horizontally across the incline, creating a two-dimensional separation mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures uniform deposition of viscous fluids by effectively removing bubbles, reducing irregularities and enhancing the quality of pattern transfer processes in integrated circuits.
Implementation Method 1
allow bubbles to rise and burst
Implementation Method 2
evacuate gas
Data Source
AI summary
A method includes receiving, in a first vessel, a flow of fluid from a second vessel, wherein the flow of fluid is generated by pressurizing a head space over the fluid in the second vessel; capturing the flow of fluid from the second vessel at an upper end of a de-bubbling slide in the first vessel; and directing the flow of fluid along a flow surface of de-bubbling slide to a lower portion of the first vessel, such that bubbles and dissolved gases in the fluid exit the fluid on the flow surface of the de-bubbling slide.