Decomposable Resist Film for Dry Pattern Formation

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Conventional photoresists require a development step using a developer and pure water, which can lead to environmental pollution and a desire for a dry process to improve the work environment.

Innovation Solution

A method using a decomposable film composed of aliphatic polycarbonate and an acid/base generator that generates an acid or base upon irradiation, followed by irradiation and heating to decompose the film, allowing pattern formation without a liquid development step.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If conventional photoresist is used with liquid developer, then pattern formation is achieved, but environmental pollution occurs and work environment deteriorates

Engineering Contradiction:

Improveenvironmental pollutionVSAvoidpattern formation capability

Core Design Contradiction:

Object-affected harmful factorsVSEase of manufacture

Solution Approach 1:

The patent replaces the liquid developer chemical system with a thermal decomposition system. The photopolymer composition is designed to decompose thermally after exposure, eliminating the need for liquid developer and water, thus removing environmental pollution and simplifying the manufacturing process while maintaining pattern formation capability

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the decomposition mechanism from chemical (requiring liquid developer) to thermal (heating). By controlling the decomposition temperature and using photopolymer materials with specific thermal properties, the system achieves pattern formation through thermal decomposition rather than chemical development, eliminating harmful liquid waste

Inventive Principle:

Principle #35Parameter changes

2Ease of manufacture

If decomposable film is used, then dry process is achieved, but film decomposition requires precise temperature control

Engineering Contradiction:

Improvedry process capabilityVSAvoidtemperature control precision

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent optimizes the decomposition temperature range to 30-120°C, making the process more tolerant to temperature variations. This broader temperature window reduces the need for precise temperature control while maintaining effective decomposition, thus balancing ease of manufacture with manufacturing precision requirements

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent incorporates an acid/base generator that is activated upon irradiation before thermal decomposition. This preliminary chemical activation lowers the back-biting initiation temperature of the aliphatic polycarbonate, enabling decomposition at relatively low temperatures (30-120°C) and reducing the stringency of temperature control requirements

Inventive Principle:

Principle #10Preliminary action

3Temperature

If aliphatic polycarbonate is used, then low temperature decomposition is achieved, but film strength may be reduced

Engineering Contradiction:

Improvedecomposition temperatureVSAvoidfilm strength

Core Design Contradiction:

TemperatureVSStrength

Solution Approach 1:

The patent creates a composite photopolymer system combining aliphatic polycarbonate with specific additives and an acid/base generator. This composite formulation allows the aliphatic polycarbonate to decompose at low temperatures (30-120°C) while the other components compensate for any strength reductions, maintaining overall film integrity during handling and processing

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent uses irradiation to activate the acid/base generator before thermal decomposition. This preliminary action generates acid or base that lowers the back-biting initiation temperature of the aliphatic polycarbonate, enabling controlled low-temperature decomposition while the activated state prepares the material for efficient, uniform decomposition without compromising film strength during the processing period

Inventive Principle:

Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method enables easy decomposition of the film and formation of a resist pattern through a dry process, reducing environmental impact and simplifying the manufacturing process.

Implementation Method 1

an acid/base generator that generates an acid or base by irradiation with energy rays

Methodology Applied

Scientific EffectPhotochemical reaction: Photopolymerisation

Implementation Method 2

a decomposition step of heating the decomposable film to decompose the entire surface of the decomposable film

Methodology Applied

Scientific EffectThermal decomposition: Pyrolysis

Data Source

PatentEP4692939A1Method for using degradable film and method for producing resist pattern

Publication Date: 2026.02.11 LINTEC CORP

AI summary

A method of using a decomposable film, comprising: a step of preparing a decomposable film containing an aliphatic polycarbonate and an acid/base generator that generates an acid or base by irradiation with energy rays, the decomposable film containing 10 mass% or less of a pressure sensitive adhesive resin other than the above aliphatic polycarbonate; an irradiation step of irradiating an entire surface of the above decomposable film or a part of the above decomposable film in a planar view with energy rays; and a decomposition step of heating the decomposable film to decompose the entire surface of the decomposable film or the part of the decomposable film in the planar view. According to the method of using a decomposable film, the decomposable film can be easily decomposed.