Semiconductor/Solid-State Device Manufacturing TRIZ Cases
- Decomposable Resist Film for Dry Pattern Formation
Irradiation-triggered acid or base generation lets an aliphatic polycarbonate film decompose by heating, enabling dry resist patterning without liquid developer.
- Resist Underlayer Film Composition for Hard, Bend-Resistant Etching
A glycoluril-phenolic polymer composition raises resist underlayer film density and hardness while limiting bending after etching.