Thin Film Deposition Apparatus with Dynamic Mask Alignment
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Solution Overview
Problem
The deposition method using a fine metal mask (FMM) faces challenges in manufacturing large-sized display devices due to mask bending and alignment issues, which are not conducive for high-definition patterning and mass production.
Innovation Solution
A thin film deposition apparatus is designed with a deposition source, patterning slit sheet, barrier plate assembly, position detection member, and alignment control member, allowing for relative movement between the substrate and deposition components to maintain precise alignment and deposition quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If a large-sized fine metal mask is used for deposition, then the device size can be increased, but the mask bends due to self-gravity causing pattern distortion
Solution Approach 1:
The patent divides the deposition process into multiple stages by segmenting the mask movement. Instead of using a single large mask that sags, the system uses a smaller mask that moves sequentially across the substrate in multiple deposition steps, maintaining precision while achieving large-area coverage
Solution Approach 2:
The patent transforms the static large mask into a dynamic system where a smaller mask moves relative to the substrate. The mask position is dynamically adjusted during deposition through coordinated movement of the mask and substrate, preventing sagging while covering large areas
2Manufacturing precision
If the deposition source is close to the substrate for high-definition patterning, then pattern resolution is improved, but shadow zones increase and deposition uniformity deteriorates
Solution Approach 1:
The patent employs dynamic coordination between mask movement and substrate movement. The mask and substrate move in a synchronized manner, allowing the deposition source to maintain optimal distance while achieving both high resolution and uniformity through continuous positional adjustment
Solution Approach 2:
The patent implements continuous deposition through coordinated movement. The mask and substrate move continuously in a synchronized fashion, ensuring uninterrupted material deposition that maintains both pattern resolution and film uniformity across the entire substrate area
3Manufacturing precision
If a fine metal mask is used for deposition, then pattern definition is improved, but mask contact with substrate causes defects
Solution Approach 1:
The patent uses dynamic movement to maintain optimal spacing between the mask and substrate. Instead of fixed contact, the mask and substrate move relative to each other in a controlled manner, preserving pattern definition while eliminating contact-related defects through continuous positional adjustment
Solution Approach 2:
The patent introduces controlled spacing as an intermediary between the mask and substrate. By maintaining a small but controlled distance through coordinated movement, the system achieves good pattern definition without direct contact, preventing defects while preserving patterning quality
4Area of stationary object
If multiple deposition processes are used for large devices, then coverage is improved, but manufacturing complexity and time increase
Solution Approach 1:
The patent segments the large substrate into multiple deposition zones that are covered sequentially. A smaller mask moves across different regions of the substrate in a systematic pattern, achieving complete coverage while simplifying the overall process compared to using multiple large masks or complex multi-step procedures
Solution Approach 2:
The patent makes a single smaller mask perform multiple functions by moving it to different positions and orientations. The same mask deposits patterns across the entire large substrate area through coordinated movement, eliminating the need for multiple specialized masks or deposition systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the production of large-sized display devices with improved manufacturing yield and high-definition patterning, reducing defects and manufacturing costs by allowing for precise alignment and efficient deposition without the need for large, cumbersome masks.
Implementation Method 1
a deposition source for discharging a deposition material
Data Source
AI summary
A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.