Deposition Chamber Particle Detection Using Real-Time Light Scattering
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Solution Overview
Problem
Existing methods for monitoring contaminants in deposition chambers are invasive, time-consuming, and costly, and do not provide real-time feedback, disrupting the manufacturing process and introducing additional contaminants.
Innovation Solution
A system using light scattering data to detect particulate contaminants within deposition chambers without interrupting the manufacturing process, employing one or more light sources to illuminate the chamber, capturing scattered light with a camera, and processing the data to determine the distribution and quality of materials being grown.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If invasive monitoring methods are used to detect contaminants, then measurement capability is improved, but the manufacturing process is disrupted and additional contaminants are introduced
Solution Approach 1:
The patent uses light as an intermediary substance to detect contaminants without direct physical contact. Light beams pass through the deposition chamber, and scattered light from particles is detected by sensors outside the chamber, enabling measurement without introducing contaminants or disrupting the manufacturing process
Solution Approach 2:
The patent replaces mechanical/invasive monitoring methods with optical detection. Instead of using physical probes or sampling devices that would contaminate the chamber, the system uses light scattering phenomena to detect particle presence, eliminating the need for mechanical intervention
2Loss of time
If real-time monitoring is implemented, then feedback speed is improved, but system complexity increases
Solution Approach 1:
The patent implements continuous real-time monitoring by maintaining constant light beams through the deposition chamber throughout the manufacturing process. This allows uninterrupted detection of contaminants and provides immediate feedback without stopping or pausing the deposition process
Solution Approach 2:
The system monitors changes in light scattering parameters to detect contaminants. By measuring variations in scattered light intensity and patterns, the system can identify particle presence and track contamination levels in real-time, providing rapid feedback with relatively simple detection logic
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables non-intrusive, real-time monitoring of contaminants, providing immediate feedback and improving the quality of materials by mapping the intensity of scattered light to physical locations, allowing for adjustments to reduce contaminants and enhance material purity.
Implementation Method 1
A system using light scattering data to detect particulate contaminants within deposition chambers
Data Source
AI summary
Implementations disclosed describe a system that includes a deposition chamber, a light source to produce an incident beam of light, wherein the incident beam of light is to illuminate a region of the deposition chamber, and a camera to collect a scattered light originating from the illuminated region of the deposition chamber, wherein the scattered light is to be produced upon interaction of the first incident beam of light with particles inside the illuminated region of the deposition chamber. The described system may optionally have a processing device, coupled to the camera, to generate scattering data for a plurality of locations of the illuminated region, wherein the scattering data for each location comprises intensity of the scattered light originating from this location.