Thin Film Deposition Apparatus Scanning Mask for Large Displays
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Solution Overview
Problem
Existing thin film deposition methods face challenges in forming high-definition organic thin film patterns on large substrates due to mask distortion caused by self-gravity, leading to manufacturing inefficiencies and defects in large-sized organic light-emitting display apparatuses.
Innovation Solution
A thin film deposition apparatus that uses a smaller patterning slit sheet, which is moved relative to the substrate, allowing for continuous deposition in a scanning manner, reducing the need for a large, rigid mask and preventing mask-substrate contact defects, while maintaining deposition uniformity through multiple nozzles and barrier walls.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a large-sized FMM mask is used for deposition on large substrates, then the substrate area coverage is improved, but the mask bends due to self-gravity causing pattern distortion
Solution Approach 1:
The patent divides the single large FMM mask into multiple smaller FMM masks arranged in an array. Each small FMM mask corresponds to a specific deposition source nozzle, allowing independent positioning and preventing gravitational bending while maintaining coverage of large substrate areas through the distributed array configuration.
Solution Approach 2:
The patent introduces a movable deposition source assembly that can scan across the substrate surface. The deposition sources and corresponding small FMM masks are positioned on a movable stage that scans in the x-y direction, enabling dynamic coverage of large areas without requiring a single large static mask.
2Manufacturing precision
If a smaller patterning slit sheet is moved relative to the substrate, then the manufacturing precision is improved, but the deposition time increases due to scanning motion
Solution Approach 1:
The patent combines multiple deposition sources with their corresponding small FMM masks into integrated deposition assemblies. Multiple nozzles are arranged in arrays and move together as a unit, allowing parallel deposition across multiple regions simultaneously, which reduces the total scanning time compared to single-point sequential deposition.
Solution Approach 2:
The patent implements continuous scanning motion of the deposition source assembly across the substrate while maintaining constant deposition rates. The movable stage enables continuous coverage without stopping, and the array configuration ensures that deposition continues uniformly across all regions throughout the scanning process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient, high-definition patterning on large substrates with improved manufacturing yield and reduced production time, allowing for the mass production of large-sized organic light-emitting display apparatuses with enhanced uniformity and reduced equipment costs.
Implementation Method 1
a deposition source (110) that deposits material towards the substrate (500)
Data Source
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AI summary
A thin film deposition apparatus used to manufacture large-sized display apparatuses on a mass scale and that allows high-definition patterning, and a method of manufacturing an organic light-emitting display apparatus using the same, the apparatus including a loading unit (710) fixing a substrate (500) onto an electrostatic chuck (600); a deposition unit (730) including a chamber (731) maintained in a vacuum state and a thin film deposition assembly (100,200,300,400) disposed in the chamber (731), separated from the substrate (500) by a predetermined distance, to deposit a thin film on the substrate (500) fixed on the electrostatic chuck (600); an unloading unit (720) separating the substrate (500) on which a deposition process is completed, from the electrostatic chuck (600); a first circulation unit (610) sequentially moving the electrostatic chuck (600) on which the substrate (500) is fixed from the loading unit (710) to the deposition unit (730), and the unloading unit (720); and a second circulation unit (620) returning the electrostatic chuck (600) separated from the substrate (500) to the loading unit (710) from the unloading unit (720), wherein the first circulation unit (610) passes through the chamber (731) when passing through the deposition unit (730).