Developing Apparatus Nozzle Spreads Liquid Puddle for Uniform Resist
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Solution Overview
Problem
In photolithography processes for semiconductor device manufacturing, the variation in reaction conditions of the developing solution with the resist film due to centrifugal force causes non-uniform critical dimension (CD) and deteriorates critical dimension uniformity (CDU) across the substrate.
Innovation Solution
A developing apparatus with a cup module and rotating mechanism that forms a liquid puddle on the substrate using a nozzle with a contact portion smaller than the substrate surface, moving it to spread the puddle uniformly across the substrate, thereby maintaining concentration uniformity and improving CDU.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the developing solution is supplied onto the substrate and spread by centrifugal force, then the developing solution flows across the substrate surface, but the concentration of the developing solution changes in the flow direction causing critical dimension uniformity deterioration
Solution Approach 1:
A liquid receiving cup is introduced as an intermediary component between the developing solution supply and the substrate. The cup receives the developing solution and allows it to form a liquid film that flows down its inner surface onto the substrate. This intermediary structure controls the flow path and maintains concentration uniformity by preventing direct centrifugal spreading across the substrate surface.
Solution Approach 2:
The invention changes the physical parameters of the developing solution delivery system by transitioning from direct substrate application to cup-mediated delivery. The liquid receiving cup modifies the flow dynamics, velocity distribution, and concentration profile of the developing solution, ensuring uniform reaction conditions across the substrate while maintaining effective coverage.
2Manufacturing precision
If a nozzle is disposed above the central portion of the substrate and brought into contact with the developing solution, then a liquid film is formed on the substrate, but the apparatus size increases
Solution Approach 1:
The liquid receiving cup serves multiple functions: it receives the developing solution from the supply nozzle, forms a controlled liquid film, guides the flow onto the substrate, and maintains concentration uniformity. This multi-functional design eliminates the need for separate components, thereby preventing apparatus size increase while achieving uniform liquid film formation.
Solution Approach 2:
The liquid receiving cup is positioned within the existing apparatus structure, nesting the solution delivery and film formation functions within the available space. The cup's inner circumference is disposed within a predetermined distance from the substrate center, utilizing the existing apparatus volume efficiently without requiring additional space.
3Productivity
If the developing solution is supplied from a nozzle while rotating the substrate, then the developing process is performed, but liquid splashing occurs during rotation
Solution Approach 1:
The liquid receiving cup acts as a mediator that intercepts the developing solution before it is subjected to high-speed centrifugal forces. The cup's structure contains and guides the liquid flow in a controlled manner, preventing uncontrolled splashing while still allowing the substrate to rotate for uniform processing.
Solution Approach 2:
The invention converts the potentially harmful centrifugal force that causes splashing into a beneficial flow control mechanism. The liquid receiving cup utilizes the centrifugal force to guide the developing solution smoothly down its inner surface and onto the substrate in a controlled film, transforming the splashing problem into a uniform delivery solution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances the uniformity of the resist pattern line width within the substrate plane and reduces the consumption of developing solution, while suppressing the increase in apparatus size and liquid splashing during rotation.
Implementation Method 1
by the movement of the supply position of the developing solution and the action of a centrifugal force, a liquid film of the developing solution is formed on the substrate and the developing solution forming the liquid film flows
Data Source
AI summary
A developing apparatus includes a first cup module and a second cup module arranged to be spaced apart from each other in a transverse direction; a first developing solution nozzle configured to wait in a standby position between the first cup module and the second cup module; and a first moving mechanism configured to move the first developing solution nozzle between the standby position and a processing position in which the developing solution is supplied to the substrate, wherein the first developing solution nozzle includes an ejection hole configured to eject the developing solution to form a liquid puddle on a surface of the substrate, the first developing solution nozzle includes a contact portion formed smaller than the surface of the substrate and installed to face the surface of the substrate, and the first developing solution nozzle spreads the liquid puddle on the substrate.