Dielectric-Supported Ion Grid Structure for Closer Grid Spacing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing ion grid structures in ion beam etching systems face challenges in enhancing the intensity and efficiency of ion beam extraction, with limitations in mechanical strength and uniformity, particularly due to constraints on grid parameters such as distance, thickness, and voltage.
Innovation Solution
The ion grid structure incorporates a dielectric framework, where the screen grid and additional grids are in contact with a dielectric material, allowing the mechanical strength to be borne by the dielectric, thereby enabling thinner grids and closer spacing without breakdown issues, and includes specific configurations like acceleration, deceleration, and focus grids to enhance ion beam extraction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the grid thickness and distance between grids are reduced to improve ion beam extraction intensity, then the mechanical strength and stability of the grid structure deteriorate
Solution Approach 1:
The patent employs a composite structure combining metal grids with dielectric material. The metal grids provide electrical conductivity and ion extraction functionality, while the dielectric material provides mechanical strength and structural support. This composite approach allows the grids to be made thinner with smaller spacing while maintaining overall structural integrity, directly resolving the contradiction between improving ion beam extraction intensity and maintaining mechanical strength.
2Productivity
If the screen grid thickness is reduced to increase ion beam current, then the mechanical strength and reliability of the grid structure worsen
Solution Approach 1:
By combining thin metal screen grids with dielectric material, the invention achieves both high ion beam current extraction and structural reliability. The dielectric component compensates for the reduced thickness of the metal grid, ensuring mechanical reliability while allowing the grid design to optimize for maximum ion current extraction.
Solution Approach 2:
The dielectric material acts as an intermediary that provides mechanical support to the thin metal grids. This intermediary structure allows the grids to be optimized for electrical performance (thinness for current extraction) while the dielectric ensures structural reliability, resolving the contradiction between these two requirements.
3Productivity
If the distance between screen grid and acceleration grid is reduced to improve extraction efficiency, then the risk of electrical breakdown increases
Solution Approach 1:
The dielectric material in the composite structure provides electrical insulation between the closely spaced metal grids. This allows the grids to be positioned closer together to improve extraction efficiency while the dielectric prevents electrical breakdown by blocking discharge paths between the grids.
Solution Approach 2:
The dielectric material serves as an electrical intermediary that prevents direct contact and potential breakdown between adjacent metal grids. This intermediary layer enables closer grid spacing for improved efficiency while maintaining electrical safety by preventing breakdown.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration improves the mechanical strength and stability of the ion grid, leading to enhanced ion beam extraction intensity and uniformity, thereby improving the reliability and efficiency of the ion beam etching process.
Implementation Method 1
the dielectric is configured as a grid framework of the ion grid structure, so that the mechanical strength of the grid is borne by the dielectric
Implementation Method 2
Ions within the plasma are extracted and accelerated by an ion grid
Implementation Method 3
Process gases inside the ion source chamber are excited by radio-frequency electromagnetic waves under low-pressure conditions to generate plasma
Implementation Method 4
The particle beam reaches a surface of a substrate, and physical etching is achieved through the bombardment of the accelerated particles
Data Source
Figure 1~3
Figure 4
Figure 5
AI summary
The present application provides an ion grid structure in ion beam etching, comprising: a screen grid and at least one grid located on the side of the screen grid away from a discharge chamber. The screen grid is in contact with a dielectric; at least one of the grids is in contact with the dielectric. According to the present application, the dielectric is provided as the grid skeleton of the ion grid structure, so that the mechanical strength of the grids is borne by the dielectric, thereby improving the mechanical strength of the ion grid structure, and enhancing the stability and reliability of the ion grid structure.