Dielectric Sealed Electrodes for Plasma Oxidation Prevention
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate processing apparatuses face electrode deterioration due to residual oxygen in inert gas and sealing issues, leading to reduced electrode performance and lifespan during high-temperature plasma processing of silicon wafers.
Innovation Solution
The apparatus employs a dielectric protection container to seal discharge electrodes, using inductive coupling for high-frequency power transfer, which prevents oxygen exposure and eliminates direct electrical contact, thus protecting the electrodes from oxidation and extending their lifespan.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If discharge electrodes are exposed to high-temperature processing environment, then plasma processing can be performed, but electrodes deteriorate due to oxidation from residual oxygen
Solution Approach 1:
The system is divided into a high-temperature processing chamber and a low-temperature electrode chamber separated by a partition wall. The electrodes are located in the low-temperature chamber where oxidation is prevented, while the high-temperature chamber maintains processing temperature. This spatial segmentation allows both high temperature processing and electrode protection to coexist.
Solution Approach 2:
A dielectric member (insulating barrier) is introduced as an intermediary between the electrodes and the high-temperature processing environment. This dielectric member allows electromagnetic coupling for power transmission while physically isolating the electrodes from oxidative conditions, enabling both plasma generation and electrode protection.
2Reliability
If electrodes are sealed in protection tubes, then oxidation is prevented, but power supply becomes complex requiring electromagnetic coupling
Solution Approach 1:
The system replaces direct mechanical electrical contact with electromagnetic coupling. Instead of conducting electricity through physical contacts that would compromise the sealed environment, the invention uses electromagnetic fields to transmit power across the dielectric barrier, simplifying the sealing requirement while maintaining power supply functionality.
Solution Approach 2:
The system changes the frequency parameter of power transmission to enable electromagnetic coupling. By using high-frequency alternating current, the system achieves efficient power transfer through the dielectric member via electromagnetic induction, making the complex power supply structure feasible and effective.
3Device complexity
If direct electrical contact is used for power supply, then power transmission is simple, but electrodes are exposed to oxygen and deteriorate
Solution Approach 1:
A dielectric member serves as an intermediary that enables power transmission without direct electrical contact. This intermediary component transmits electromagnetic energy from the power supply to the electrodes while maintaining the sealed protective environment, preventing oxidation without requiring complex wiring or contacts within the protection tube.
4Ease of repair
If electrodes are pulled outside for maintenance, then replacement is possible, but sealing failures occur and oxidation happens
Solution Approach 1:
The system segments the electrode assembly from the processing chamber through a sealed interface. The electrodes remain permanently sealed within the protection tubes during operation, and maintenance can be performed by replacing entire sealed assemblies without compromising the sealing of other components. This eliminates repeated sealing operations that lead to failures.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively prevents electrode deterioration, enhancing their longevity and maintaining performance during high-temperature plasma processing by isolating them from oxidizing environments and eliminating maintenance-related positional issues.
Implementation Method 1
electric power is supplied from the electricity-feeding section to the electricity-receiving section by electromagnetism coupling
Implementation Method 2
High frequency electric power generated by an oscillator of a high frequency power supply 273 is applied to ends 301 of the discharge electrodes 269 to generate plasma 224 between the discharge electrodes 269 in the buffer chamber 237, and thereby to excite reaction gas supplied from a gas nozzle 233 with plasma
Data Source
AI summary
Disclosed is a substrate processing apparatus, comprising a processing chamber to accommodate one or more substrates, a gas supply section to supply processing gas into the processing chamber, a gas discharge section to discharge the processing gas from the processing chamber, at least a pair of electrodes provided inside the heating section to plasma-excite the processing gas, a protection container made of dielectric to air-tightly accommodate the electrodes, an electricity-receiving section which is electrically connected to the electrodes and which is accommodated in the protection container, and an electricity-feeding section to which high frequency electric power is applied and which is provided near the electricity-receiving section in a state in which at least a wall of the protection container is interposed between the electricity-receiving section and the electricity-feeding section, wherein electric power is supplied from the electricity-feeding section to the electricity-receiving section by electromagnetism coupling.