Display Exposure Alignment Keys for Higher-Luminance Partition Walls
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Solution Overview
Problem
The alignment keys on the substrate of display devices are not recognized during the exposure process due to the presence of a scattering material in the light blocking member, which affects the formation of the partition wall structure and reduces the luminance of the display device.
Innovation Solution
A method is employed where first alignment keys are formed on the mother substrate in a specific direction, and the photoresist is applied without overlapping these keys, allowing for easy recognition during the mask alignment process. The method involves rotating the mother substrate at a preset angle and using titanium oxide in the photoresist to enhance luminance, while ensuring the exposure process is performed in a single pass without residual film formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If scattering material is added to the light blocking member to increase luminance, then luminance is improved, but alignment keys cannot be recognized during exposure process
Solution Approach 1:
The patent divides the light blocking member into two functional parts: alignment keys (first light blocking members) that are transparent or light-transparent for recognition, and scattering material regions (second light blocking members) that are opaque for increasing luminance. This segmentation allows each part to perform its specific function without interfering with the other.
Solution Approach 2:
Different regions of the light blocking member are assigned different optical properties: the alignment key regions have high transparency to enable recognition during exposure, while the scattering material regions have low transparency to maximize light scattering and luminance enhancement. This local differentiation resolves the contradiction between recognition and luminance.
2Ease of manufacture
If photoresist is applied to cover alignment keys for uniform coverage, then manufacturing simplicity is improved, but alignment key recognition during exposure is prevented
Solution Approach 1:
The photoresist is applied selectively: it covers the scattering material regions to define the partition wall structure, but it is deliberately excluded from the alignment key regions. This selective application maintains alignment key visibility for the exposure process while still achieving uniform coverage where needed.
Solution Approach 2:
The alignment keys are designed with light-transparent properties in advance, before the photoresist application step. This preliminary design ensures that when photoresist is applied, the alignment keys remain visible and recognizable during the subsequent exposure process, enabling precise pattern transfer.
3Manufacturing precision
If exposure process is performed in multiple passes to ensure complete coverage, then manufacturing precision is improved, but process time is increased
Solution Approach 1:
The light blocking member is segmented into alignment key regions and scattering material regions with different optical properties. This segmentation allows the exposure process to complete in a single pass, as the alignment keys guide the exposure while the scattering material regions are simultaneously exposed and developed, eliminating the need for multiple passes.
Solution Approach 2:
The alignment keys act as intermediaries that facilitate the exposure process. Their light-transparent nature allows them to be recognized and used for alignment during the exposure process itself, enabling single-pass exposure while maintaining precision through the intermediary alignment features.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for improved recognition of alignment keys, increases the luminance of the display device, and reduces the process time by ensuring the exposure process is performed efficiently without residual films.
Implementation Method 1
a photoresist is formed in a second direction on the first and second light emitting structures by using a coater such that the photoresist does not to overlap the first alignment keys
Implementation Method 2
the partition wall structure may further include a scattering material in order to increase a luminance of the display device
Data Source
AI summary
A method of manufacturing a display device includes providing a mother substrate including a first cell region, a second cell region, and a peripheral region. First alignment keys arranged in a first direction in the peripheral region on the mother substrate is formed such that the first alignment keys are adjacent to a first side portion of each of first and second light emitting structures, while forming the first and second light emitting structures in the first and second cell regions on the mother substrate, respectively. A photoresist is formed in a second direction on the first and second light emitting structures by using a coater such that the photoresist does not to overlap the first alignment keys. The mother substrate is rotated at a preset angle. A light is irradiated to the photoresist by moving an exposer in a direction in which the first alignment keys are arranged.