Display Contact Electrode Layout Without Extra Insulating Layers
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Solution Overview
Problem
The existing methods for forming contact electrodes in light-emitting display devices require additional element insulating layers, increasing costs and being limited by the resolution and overlay ability of exposure machines.
Innovation Solution
A method where the first and second contact electrodes are formed on the same layer, using different materials with distinct physical properties to overcome the limitations of exposure machine resolution and overlay ability, allowing for simplified manufacturing without the need for separate element insulating layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the first contact electrode and the second contact electrode are formed on different layers, then the electrode performance is ensured, but additional element insulating layers are required which increases manufacturing costs and process complexity
Solution Approach 1:
The patent merges the first contact electrode and second contact electrode onto the same layer (the second element insulating layer), eliminating the need for separate element insulating layers for each electrode. This consolidation reduces manufacturing process complexity and costs while maintaining electrode functionality through proper material selection and layer design.
Solution Approach 2:
The second element insulating layer serves multiple functions: it acts as the substrate for both the first and second contact electrodes, provides electrical insulation, and maintains structural integrity. This multi-functional design eliminates the need for additional dedicated insulating layers, simplifying the overall device structure.
2Ease of manufacture
If the first contact electrode and the second contact electrode are formed on the same layer, then the manufacturing process is simplified, but the resolution and overlay ability of the exposure machine are limited
Solution Approach 1:
The patent changes the material parameters of the element insulating layer by selecting a material with a low etching rate (such as silicon oxide or silicon nitride). This parameter change allows for easier formation of contact electrodes on the same layer while maintaining sufficient manufacturing precision, as the low etching rate material provides better etching control and reduces the impact of exposure machine limitations.
3Ease of manufacture
If a material with low etching rate is used for the element insulating layer, then the contact electrodes can be easily formed, but the etching process requires more time or higher energy
Solution Approach 1:
By selecting an element insulating layer material with a low etching rate (such as silicon oxide or silicon nitride), the patent achieves easier contact electrode formation through better etching control and reduced material removal variability. Although low etching rate materials may require adjusted etching parameters, the overall process efficiency is improved due to reduced rework and better dimensional control.
Data Source
AI summary
A display device includes: a substrate; first banks spaced apart from each other on the substrate; a first electrode and a second electrode covering the first banks and spaced apart from each other; a light-emitting element between the first electrode and the second electrode; a first contact electrode connected to the first electrode and contacting one end of the light-emitting element; and a second contact electrode connected to the second electrode and contacting another end of the light-emitting element. The first contact electrode includes a first material, the second contact electrode includes a second material, and physical properties of the first material and the second material are different from each other.