Display Electrode Layout With Shared Etching and Fewer Photomasks
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Solution Overview
Problem
The existing technologies for manufacturing display devices, such as those described in JP 2014-149410 A and JP 2022-522556 T, face challenges with long processing times and the need for multiple photomasks for patterning, which complicates the manufacturing process and increases complexity.
Innovation Solution
The proposed display device and manufacturing method involve a configuration with specific layers and contact holes formed in the insulating films to reduce processing steps and time, using a first semiconductor portion made of polysilicon and a second semiconductor portion made of oxide semiconductor, with overlapping electrodes and insulating films to simplify the patterning process and reduce the number of required photomasks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If separate etching steps are performed for pixel electrode and source/drain electrodes, then manufacturing precision is improved, but productivity deteriorates due to long processing time
Solution Approach 1:
The patent combines the etching steps for pixel electrodes and source/drain electrodes into a single simultaneous etching process. The etching conditions are optimized to etch the metal film forming source/drain electrodes and the transparent conductive film forming pixel electrodes at appropriate rates, allowing both electrodes to be formed in one step rather than separate steps, thus improving productivity while maintaining manufacturing precision.
2Manufacturing precision
If multiple photomasks are used for patterning different layers, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent makes the first photomask serve multiple functions by using it for patterning both the metal film (source/drain electrodes) and the transparent conductive film (pixel electrodes) in sequence. This multi-functional use of a single photomask reduces the total number of photomasks required from multiple to just one, thereby reducing device complexity while maintaining patterning precision through careful control of the etching processes.
3Manufacturing precision
If separate processing steps are used for different electrode formations, then manufacturing precision is improved, but loss of time increases
Solution Approach 1:
The patent implements continuous useful action by performing the etching of the metal film and transparent conductive film in an uninterrupted sequence within a single etching step. The etching conditions are carefully controlled to ensure that both films are etched at appropriate rates without requiring intermediate steps, thereby eliminating idle time and reducing total processing time while maintaining the precision needed for proper electrode formation.
Data Source
AI summary
A display device includes a first semiconductor portion, a first insulating film, a first electrode, a second electrode, a second insulating film, a second semiconductor portion, a third insulating film, a third electrode, and a fourth electrode, the second insulating film is disposed to overlap at least the second semiconductor portion and is not formed in a range overlapping the first semiconductor portion, the first insulating film and the third insulating film are each provided with a first contact hole connecting the third electrode to the first semiconductor portion, and the third insulating film is provided with a second contact hole connecting the fourth electrode to the second semiconductor portion.