Display Substrate Groove Layout for TFT Gas Isolation
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Solution Overview
Problem
The performance of oxide semiconductor thin film transistors (TFTs) is negatively affected by gases released during high-temperature manufacturing processes, leading to poor switching voltage and reliability issues in display products.
Innovation Solution
A display substrate with a groove structure in the flattening layer above the TFT, allowing gases to escape outside while maintaining protection of the channel area, reducing the impact of released gases on device characteristics and improving TFT performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an oxide semiconductor active layer is used to achieve high carrier migration rate, then the TFT performance is improved, but the component characteristics are easily affected by gases released during high-temperature manufacturing processes
Solution Approach 1:
The patent extracts the harmful gases released during high-temperature manufacturing processes by designing a groove structure in the flattening layer. The groove allows gases to escape from the encapsulation layer without diffusing into the channel area of the oxide semiconductor active layer, thus protecting the TFT performance while maintaining the benefits of high carrier migration rate
Solution Approach 2:
The groove structure acts as an intermediary element between the encapsulation layer and the channel area. It provides a designated pathway for gas release that prevents direct contact between harmful gases and the sensitive oxide semiconductor active layer, thereby mediating the interaction between manufacturing processes and device performance
2Object-affected harmful factors
If a flattening layer is added to protect the channel area, then the protection effect is improved, but the device structure becomes more complex
Solution Approach 1:
The flattening layer is segmented by introducing a groove structure that divides it into different regions. The groove creates a distinct gas release pathway separated from the channel area, allowing the flattening layer to simultaneously provide protection and facilitate gas release without requiring additional independent structures
Solution Approach 2:
The flattening layer with the groove structure performs multiple functions: it maintains surface flatness for subsequent processing, protects the underlying structures, and provides a controlled pathway for gas release. This multi-functionality reduces the need for additional separate components, thereby limiting the increase in device complexity
Data Source
AI summary
The present disclosure relates to the field of display technology, and discloses a display substrate, a preparation method thereof, and a display panel, used for improving the structure of the display substrate, improving characteristics of a thin film transistor, and increasing the yield of a display product. The display substrate includes: a base substrate; a thin film transistor on the base substrate; and a flattening layer on a side, away from the base substrate, of the thin film transistor, wherein the flattening layer is provided with a groove around a channel area of the thin film transistor, and an orthographic projection of the groove on the base substrate is not overlapped with an orthographic projection of the channel area on the base substrate.