Display Substrate Mask Strategy for Cost Reduction
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Solution Overview
Problem
The existing photolithography process for producing touch products requires multiple customized mask plates for each layer, leading to high production and development costs due to the need for redesigning masks for even slight changes in peripheral traces and bonding regions, especially for products with the same overall size but different pattern arrangements.
Innovation Solution
A method for preparing a display substrate that involves forming a base substrate with distinct regions, using a first mask and photoresist to create a structure in one region, and then using a second mask to pattern a functional material layer in the other region, allowing for the reuse of masks and reducing the need for frequent redesign and customization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a new mask plate is customized for each layer and product variation, then high alignment precision and manufacturing quality are achieved, but production and development costs increase significantly
Solution Approach 1:
The substrate is divided into a first region (peripheral region) and a second region (active area region), allowing different processing approaches for each region. The first mask is used to form structures in the first region, while the second mask patterns the functional material layer in the second region, enabling region-specific optimization.
Solution Approach 2:
The first mask serves multiple functions: it is used to form the first structure in the first region and also to pattern the functional material layer in the second region. This multi-functional use of the first mask reduces the total number of masks needed and lowers customization costs.
2Manufacturing precision
If mask plates are redesigned for every product change, then pattern accuracy is maintained, but production time and development costs increase
Solution Approach 1:
The first structure is formed in the first region before the functional material layer is deposited. This preliminary structuring allows subsequent processing steps to be optimized and reduces the need for rework or mask redesign when product specifications change.
Solution Approach 2:
Different regions of the substrate are treated differently: the first region receives structures formed by the first mask, while the second region receives the functional material layer patterned by the second mask. This local differentiation allows each region to be optimized independently for its specific function.
3Reliability
If multiple customized masks are used for each layer, then high-quality touch products are produced, but manufacturing complexity and costs increase
Solution Approach 1:
The first mask is used for both forming the first structure in the first region and patterning the functional material layer in the second region. This merging of functions reduces the total number of masks from multiple customized masks to just two masks (first mask and second mask), simplifying the manufacturing process.
Solution Approach 2:
The patent introduces a spatial dimension to the masking strategy by dividing the substrate into distinct regions (first region and second region) and applying different masking approaches to each. This regional differentiation allows for reduced mask complexity while maintaining overall product quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces production and development costs by improving mask utilization and enabling high alignment precision in touch regions at a lower cost, while simplifying the production of new products by allowing pattern changes in one region without altering the other, thus lowering technical implementation difficulties for manufacturers.
Implementation Method 1
forming a first structure in the first region using a first mask and a first photoresist; performing first exposure on the second photoresist using the second mask; performing second exposure on the second photoresist using the first mask
Data Source
AI summary
A display substrate, a method for preparing the same and a display device are provided. The method for preparing the display substrate includes: providing a base substrate, in which the base substrate includes a first region and a second region; forming a first structure in the first region using a first mask and a first photoresist; forming a functional material layer at a side, which is away from the base substrate, of the first structure; and patterning the functional material layer using a second mask and the first mask to form a functional layer in the second region.