Display Substrate Signal Line Profile for Narrow-Bezel Panels
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Solution Overview
Problem
Existing display screen technologies are limited by a large frame, preventing the realization of a true full-screen display due to poor morphology of insulating layers over signal lines, which results in uneven surfaces and connectivity issues between signal lines.
Innovation Solution
A method for manufacturing a display substrate that omits the baking step of the photoresist pattern, using a mask plate to form a signal line with a reduced slope angle, and optimizing the ashing process with reduced bias power and oxygen flow to improve the morphology of the insulating layer, allowing for a narrower frame design.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the conventional baking step is performed on the photoresist pattern, then the photoresist pattern has sufficient structural stability, but the slope angle of the signal line becomes too large causing poor morphology of the insulating layer
Solution Approach 1:
The patent changes the physical-chemical parameters of the photoresist by omitting the baking step, thereby altering the photoresist's viscosity and flow characteristics. This parameter change enables the photoresist to better fill the groove during the etching process, reducing the slope angle of the signal line and improving the morphology of the insulating layer while maintaining sufficient structural stability through optimized photoresist composition and process conditions
2Area of stationary object
If the frame of the display screen is compressed to achieve full screen, then the display area increases, but the existing technology cannot achieve narrow frame due to signal line connectivity issues
Solution Approach 1:
The patent changes the slope angle parameter of the signal line by omitting the baking step, which improves the morphology of the insulating layer and ensures reliable signal line connectivity. This enables the frame to be compressed to achieve full-screen display while maintaining signal line integrity
Solution Approach 2:
The patent utilizes the fluidity and filling characteristics of the photoresist material during the etching process. By controlling the photoresist's rheological properties and the etching conditions, the photoresist naturally fills the groove to form signal lines with optimal morphology, ensuring connectivity without requiring additional structural support
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves a reduced slope angle of signal lines, optimizing the morphology of the insulating layer, preventing residue and improving the yield of display products, thus enabling a narrower frame design.
Implementation Method 1
exposing the photoresist layer by using a mask plate; developing the exposed photoresist layer to form a photoresist pattern
Implementation Method 2
ashing a photoresist by using a bias power of 3500 W to 6000 W; an etching gas used for ashing the photoresist is oxygen gas with a gas flow rate of 800 sccm to 1000 sccm
Data Source
AI summary
This application provides a display substrate, a method for manufacturing the same, and a display device, which belongs to the technical field of displays. The method for manufacturing the display substrate comprises: forming a metal layer on a base substrate; forming a photoresist layer on the metal layer; exposing the photoresist layer by using a mask plate; developing the exposed photoresist layer to form a photoresist pattern; and omitting a step of baking the photoresist pattern, and etching the metal layer by using the photoresist pattern as a mask to form a signal line. The technical solution of the present disclosure can realize a narrow frame of a display product.