Double-Height TAP Cell Grid for Latch-Up and Well Tap Resistance

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Solution Overview

Problem

The placement of TAP cells in IC layout diagrams for manufacturing ICs faces challenges such as process bottlenecks due to reduced lithography critical dimension and mixed channel effects, which affect latch-up immunity and well tap resistance.

Innovation Solution

TAP cells of different types are arranged in an interleaving manner in two transverse directions, and each TAP cell is configured to have a double cell height, allowing for improved latch-up immunity and reduced well tap resistance by optimizing their placement and design.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If TAP cells are placed closer together to reduce area, then area is reduced, but latch-up immunity deteriorates due to mixed channel effects

Engineering Contradiction:
ImproveTAP cell areaVSAvoidlatch-up immunity
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent segments TAP cells into different types (first type and second type) with different orientations. First type TAP cells have well regions extending in a first direction, while second type TAP cells have well regions extending in a second direction transverse to the first direction. This segmentation allows alternating arrangement of different types, which separates opposing dopant regions and reduces mixed channel effects, thereby maintaining latch-up immunity while reducing overall area.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces a second transverse direction for arranging TAP cells, moving beyond single-direction linear arrangement. By alternating first type and second type TAP cells in a two-dimensional grid pattern where well regions extend in orthogonal directions, the design achieves better spatial utilization and reduced interference while maintaining reliability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If lithography critical dimension is reduced to increase density, then productivity is improved, but manufacturing precision deteriorates due to process bottlenecks

Engineering Contradiction:
ImproveIC manufacturing densityVSAvoidlithography critical dimension
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies different configurations to different TAP cell types to optimize local characteristics. First type TAP cells are configured with well regions extending in one direction, while second type TAP cells have well regions extending in the transverse direction. This local differentiation allows each cell type to be optimized for its specific orientation, reducing process constraints and improving manufacturing precision at reduced critical dimensions.

Inventive Principle:
Principle #3Local quality

3Reliability

If TAP cells are arranged in alternating types in two directions, then latch-up immunity is improved, but device complexity increases

Engineering Contradiction:
Improvelatch-up immunityVSAvoidTAP cell arrangement complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent creates a universal alternating pattern that can be applied throughout the IC layout. Both first type and second type TAP cells serve the same fundamental function of providing well taps, but with orthogonal orientations. This multi-functional approach allows the same alternating pattern to be repeated across the entire chip, improving latch-up immunity through consistent spacing and orientation separation without requiring complex unique arrangements for each cell.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS12027525B2Integrated circuit device, method, and system
Publication Date: 2024.07.02 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12027525B2 patent drawing
  • US12027525B2 patent drawing
  • US12027525B2 patent drawing

AI summary

An integrated circuit (IC) device includes a plurality of TAP cells arranged at intervals in a first direction and a second direction transverse to the first direction. The plurality of TAP cells includes at least one first TAP cell. The first TAP cell includes two first end areas and a first middle area arranged consecutively in the second direction. The first middle area includes a first dopant of a first type implanted in a first well region of the first type. The first end areas are arranged on opposite sides of the first middle area in the second direction. Each of the first end areas includes a second dopant of a second type implanted in the first well region, the second type different from the first type.