Double Magnetic Tunnel Junction Device via Ultra-High Vacuum Bonding
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Solution Overview
Problem
Current double magnetic tunnel junction (DMTJ) devices face challenges in maintaining high tunnel magnetoresistance (TMR) and write efficiency due to the degradation of surface quality as additional layers are formed, particularly because the reference layer for the top MTJ is formed on top of a cumulative layered structure, leading to poor performance and reduced spin information.
Innovation Solution
The method involves separately forming two magnetic tunnel junction stacks in an ultra-high vacuum environment and bonding them together using ultra-high vacuum bonding techniques, ensuring that both reference layers are formed on their own grain erasing base layers, thereby maintaining high TMR and write efficiency by eliminating surface quality issues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If additional layers are formed on top of a cumulative layered structure, then the device complexity increases, but the surface quality degrades leading to poor performance
Solution Approach 1:
The patent divides the double magnetic tunnel junction device into two separate magnetic tunnel junction stacks that are formed independently and then bonded together. This segmentation allows each stack to be formed on its own grain erasing base layer, preventing the cumulative surface quality degradation that would occur if layers were formed sequentially on a single stack. The separation of the formation processes maintains high surface quality for both reference layers.
Solution Approach 2:
The patent applies grain erasing treatment to base layers before forming each magnetic tunnel junction stack. This preliminary action prepares the surface with high quality crystal orientation and surface morphology before deposition begins, ensuring optimal conditions for forming high-quality reference layers. By performing this preparation in advance for each separate stack, the invention avoids the surface quality degradation that would result from forming multiple layers sequentially.
2Adaptability or versatility
If the reference layer is formed on top of cumulative layered structure, then the device functionality is achieved, but the TMR and write efficiency are reduced
Solution Approach 1:
The patent segments the device into two independent magnetic tunnel junction stacks, each with its own reference layer formed on a separate grain erasing base layer. This segmentation ensures that each reference layer maintains high crystal quality and surface morphology, which are critical for achieving high TMR ratios and write efficiency. The independent formation processes prevent the cumulative degradation that would occur in a single stacked structure.
Solution Approach 2:
The patent applies grain erasing treatment locally to each base layer before forming the corresponding magnetic tunnel junction stack. This local quality enhancement ensures that each reference layer formation occurs on a surface with optimal crystal orientation and morphology, thereby maintaining high TMR and write efficiency for both junctions independently, rather than having the quality degrade across the cumulative structure.
3Reliability
If separate stacks are formed and bonded together, then the TMR and write efficiency are improved, but the manufacturing process complexity increases
Solution Approach 1:
The patent divides the manufacturing process into separate formation of two magnetic tunnel junction stacks, which are then bonded together using ultra-high vacuum bonding. While this segmentation improves TMR and write efficiency by maintaining high surface quality for each reference layer, it does increase manufacturing process complexity. The segmentation enables independent optimization of each stack's formation process.
Solution Approach 2:
The patent combines two separately formed magnetic tunnel junction stacks into a single integrated device through ultra-high vacuum bonding. This merging step integrates the benefits of separate formation (high surface quality and performance) into a unified device structure, achieving both high TMR/write efficiency and functional integration despite the increased manufacturing complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in DMTJ devices with enhanced TMR levels and write efficiency by ensuring high-quality reference layers, outperforming related art techniques by maintaining surface quality throughout the stack formation process.
Implementation Method 1
bonding the first magnetic tunnel junction stack to the second magnetic tunnel junction stack with ultra-high vacuum bonding to form the double magnetic tunnel junction device
Data Source
AI summary
A method of manufacturing a double magnetic tunnel junction device is provided. The method includes forming a first magnetic tunnel junction stack. The first magnetic tunnel junction stack includes a first reference layer. The method also includes forming a second magnetic tunnel junction stack, where the second magnetic tunnel junction stack includes a second reference layer. The method also includes bonding the first magnetic tunnel junction stack to the second magnetic tunnel junction stack with ultra-high vacuum bonding to form the double magnetic tunnel junction device.


