Separated vertical channel patterns and surrounding conductive stacks raise 3D memory density while preserving memory string selection and control.
Iridium-containing seed, spacer, and barrier layers suppress metal diffusion into the tunneling barrier and preserve MTJ film structure in MRAM.
A slanted bottom electrode and extended dielectric layer protect the MTJ stack during etching, improving MRAM alignment and switching reliability.
Beveled MTJ layers and encapsulation lower pillar aspect ratio, prevent ILD voids, and reduce top contact shorts in MRAM.
A soft-magnetic shielding layer deflects external fields from the MTJ stack, improving coercivity, durability, and reflow bit error performance.
A seed-backed pinned layer and PMA capping layer help folded SOT MRAM preserve thermal stability, free-layer retention, and TMR.
A multistage MRAM cell process uses dielectric liners and delayed tunnel barrier formation to prevent etch defects, shorts, and write errors.
Nitride regions placed near the insulating layer lower switching current and reversal energy while preserving magnetization stability and MR ratio.
A magnetic memory element uses a thick beta-phase heavy metal layer to generate spin orbit torque for magnetization reversal.
A three-dimensional magnetic device uses spin-orbit torque to reverse magnetization via a heavy metal layer.
PtCr, PtMn, and IrMn composite layers boost exchange coupling magnetic field to resolve thermal stability issues in high-temperature environments.
A chemical mechanical planarization process exposes a magnetic tunnel junction top surface for reliable electrical contact.