Double-Sided Interconnect Die Stacking Without TSVs or Interposers
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Solution Overview
Problem
Existing semiconductor die stacking methods involving additional interconnecting elements like interposers or TSVs increase cost and complexity, and prolong die-to-die interconnect length.
Innovation Solution
A semiconductor package design where a first die has interconnect layers on both sides, allowing direct coupling to a second die without intervening structures like interposers or TSVs, reducing the need for additional layers and vias.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If additional interconnecting elements like interposers or TSVs are used for die-to-die interconnection, then interconnection functionality is achieved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent extracts and eliminates the additional interconnecting elements (interposers, TSVs) from the traditional die-to-die interconnection structure. By forming interconnect layers directly on both sides of the first die, the invention removes the need for separate interposer structures and through-silicon vias, thereby reducing device complexity while maintaining interconnection functionality.
Solution Approach 2:
The patent merges the interconnection function directly into the die structure itself by forming interconnect layers on both sides of the first die. This integration eliminates the need for separate interposer components, combining the die and interconnection structures into a unified design that reduces overall complexity.
2Reliability
If additional interconnecting elements like interposers or TSVs are used for die-to-die interconnection, then interconnection functionality is achieved, but manufacturing cost increases
Solution Approach 1:
The patent extracts and eliminates the additional interconnecting elements (interposers, TSVs) from the traditional die-to-die interconnection structure. By forming interconnect layers directly on both sides of the first die, the invention removes the need for separate interposer structures and through-silicon vias, thereby reducing device complexity while maintaining interconnection functionality.
Solution Approach 2:
The patent employs standard interconnect layer formation processes that are already part of conventional semiconductor manufacturing, replacing expensive and complex TSV and interposer structures with simpler, more cost-effective planar interconnect layers that can be formed using existing fabrication techniques.
3Reliability
If additional interconnecting elements like interposers or TSVs are used for die-to-die interconnection, then interconnection functionality is achieved, but die-to-die interconnect length increases
Solution Approach 1:
The patent extracts and eliminates the additional interconnecting elements (interposers, TSVs) from the traditional die-to-die interconnection structure. By forming interconnect layers directly on both sides of the first die, the invention removes the need for separate interposer structures and through-silicon vias, thereby reducing device complexity while maintaining interconnection functionality.
Data Source
AI summary
An apparatus is provided which comprises: a first die having a first surface and a second surface, the first die comprising: a first layer formed on the first surface of the first die, and a second layer formed on the second surface of the first die; a second die coupled to the first layer; and a plurality of structures to couple the apparatus to an external component, wherein the plurality of structures is coupled to the second layer.


