Drop Pattern Placement Near Large Features for Faster Fill
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Solution Overview
Problem
Existing methods for generating drop patterns in nanoimprint lithography result in drops being dispensed too far from large features, leading to longer fill times and reduced production throughput.
Innovation Solution
A method and system for assigning drop positions by determining the distance from the center of mass of an array of cells to each cell, identifying the cell with the largest predetermined fluid volume within a threshold distance, and designating that cell as the drop position, ensuring drops are placed closer to large features.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If drops are dispensed according to conventional drop patterns, then the drop placement follows standard patterns, but the drops are dispensed too far from large features resulting in longer fill times
Solution Approach 1:
The patent applies local quality by making the drop placement strategy feature-size-dependent. Large features (≥50 microns) receive drops placed within 20 microns of their edges, while smaller features use conventional placement patterns. This localized adaptation of drop placement criteria optimizes fill time specifically for large features without compromising the overall pattern fidelity, thereby reducing total fill time and improving throughput.
2Productivity
If drops are placed closer to large features, then fill time is reduced, but the drop pattern generation complexity increases
Solution Approach 1:
The patent implements preliminary action by pre-classifying features into size categories (large features ≥50 microns versus smaller features) before drop pattern generation. This pre-processing step enables the subsequent drop placement algorithm to efficiently apply the appropriate placement criteria (within 20 microns for large features) without complex real-time calculations, thereby reducing overall computational complexity while maintaining improved throughput.
Data Source
AI summary
A method of method of assigning a drop position in a drop pattern includes receiving a predetermined fluid drop volume of a drop, receiving information regarding an array of cells defining a desired fill set associated with the predetermined fluid drop volume, wherein the information includes a predetermined fluid volume of each cell of the array of cells and a predetermined location of each cell of the array of cells, determining a distance from a center of mass of the array of cells to the predetermined location of each cell of a plurality of cells of the array of cells, identifying, among cells of the plurality of cells whose distance from the center of mass is within a predetermined threshold distance, a cell having the largest predetermined fluid volume, and assigning the predetermined location of the identified cell as the drop position of the drop in the drop pattern.