Photomechanical Apparatus TRIZ Cases
- Actuator, tilt control device, positioning device, processing apparatus, and device manufacturing method
See how a gas supply between movable part and central guide reduces friction and improves drivi
- Refrigerant Branch Heating and Moisture Filtration for Ice-Free Cooling
A heated refrigerant branch keeps moisture above its freezing point so the adsorption filter can prevent ice crystals and sustain cooling.
- Clean Stocker Layout With Downflow for Reticle and Pod Storage
A downflow clean-gas stocker uses vertically overlapped reticle and pod racks to limit wind contamination and increase compact storage.
- Heat Pipe Substrate Holder for Uniform Lithography Temperature
A phase-change heat pipe stabilizes substrate holder temperature in immersion lithography, reducing non-uniform cooling and overlay errors.
- Resist Pattern Overhang Formation for Accurate Recess Etching
A multi-gradation mask forms a resist overhang that protects recess edges from shift and dimension errors during semiconductor etching.
- Stiff Base Plate Assembly for Semiconductor Overlay Alignment
A stiff base plate stays attached through processing to limit clamping deformation and improve layer-to-layer overlay alignment.
- Imprint Tool Superstrate Registration Using Tapered Edge Measurement
A bowed plate and tapered-edge sensing improve superstrate registration on uneven substrates, supporting accurate nanoimprint layer alignment.
- Imprinted Metasurface Coatings for Protected Optical Surfaces
A stamped protective coating shields delicate metasurfaces from damage while preserving smoothness, thickness control, and optical function.
- Resist Film Formation by Temperature Control for Surface Planarity
Temperature and pressure control separate resist into gel and liquid layers, then evaporate the liquid to improve resist film planarity on uneven surfaces.