Mesa Sidewall Cleaning via Gas Flow in Nanoimprint Lithography
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Solution Overview
Problem
In nanoimprint lithography, the accumulation of formable material on template mesa sidewalls leads to defects in patterned layers due to extrusions, which affects the quality and yield of nano-fabricated structures.
Innovation Solution
A method and device are introduced that utilize gas-flow channels to direct a controlled gas flow over the mesa sidewalls, removing the accumulated formable material and preventing extrusions by adjusting the flow rate, pressure, and direction of the gas, ensuring semiconductor cleanliness standards are met.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If formable liquid is applied between the template and substrate during nanoimprint lithography, then the pattern is successfully transferred, but formable liquid extrudes and attaches to sidewalls forming defects
Solution Approach 1:
The gas flow is directed at the sidewalls before the imprinting process to prevent formable material accumulation. This preliminary cleaning action removes potential nucleation sites for extrusions before they can form during the actual imprinting process, thereby preventing defects while maintaining pattern quality
Solution Approach 2:
The gas flow, which could potentially disrupt the imprinting process, is instead used beneficially to remove formable material that would otherwise cause harmful extrusions. The controlled gas flow converts a potential disturbance into a protective cleaning mechanism that eliminates defects
2Reliability
If gas flow is directed at mesa sidewalls to remove formable material, then extrusion defects are prevented, but additional process steps and equipment are required
Solution Approach 1:
The gas delivery system is integrated into the existing nanoimprint lithography apparatus, allowing the same equipment to perform both imprinting and sidewall cleaning functions. This multi-functionality approach adds defect prevention capability without requiring a completely separate system
Solution Approach 2:
The invention uses gas flow (pneumatics) to achieve sidewall cleaning, which is a simpler and more integrated approach compared to mechanical cleaning methods. The gas delivery system can be implemented using existing pneumatic infrastructure in semiconductor manufacturing equipment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents defects by removing formable material buildup on mesa sidewalls, enhancing the quality and throughput of nanoimprint lithography processes, thereby improving the production yield of nano-fabricated structures.
Implementation Method 1
directing a gas flow through the one or more nozzles toward a portion of the at least one more mesa sidewall
Data Source
AI summary
Devices, systems, and methods position a template for imprinting a formable material over one or more gas-flow channels on a stage, wherein the template includes a patterning surface, a mesa, and at least one mesa sidewall; and direct a gas flow through the one or more gas-flow channels toward a portion of the at least one mesa sidewall.