Hydroxylamine Treatment Liquid for Stable Residue Removal
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Solution Overview
Problem
The semiconductor industry faces challenges in achieving accurate and efficient treatment of objects with treatment liquids, particularly in removing organic residues and maintaining stability over time, especially with the miniaturization of semiconductor devices.
Innovation Solution
A treatment liquid comprising water, hydroxylamine, and one or more kinds of hydrazines, along with specific anions and a chelating agent, is developed to enhance organic residue removability and stability, with a composition that includes hydrazine derivatives and anticorrosives to improve surface smoothness and metal residue solubility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional treatment liquids are used for removing organic residues, then organic residue removability is improved, but stability over time deteriorates
Solution Approach 1:
The patent changes the chemical composition parameters of the treatment liquid by specifying precise ratios of hydroxylamine (100 parts by mass) to hydrazines (0.0001 to 1 part by mass), along with controlled amounts of first anions (0.0001 to 30 parts by mass) and second anions (0.0001 to 30 parts by mass). This parameter optimization resolves the contradiction by achieving both excellent organic residue removability and stability over time through balanced chemical composition
2Reliability
If treatment liquid composition is optimized for residue removal, then organic residue removability is improved, but manufacturing complexity increases
Solution Approach 1:
The patent establishes specific concentration ranges for each component: hydroxylamine at 100 parts by mass, hydrazines at 0.0001 to 1 part by mass, first anions at 0.0001 to 30 parts by mass, and second anions at 0.0001 to 30 parts by mass. These parameter specifications optimize residue removal while maintaining manageable manufacturing complexity through defined compositional boundaries
Solution Approach 2:
The treatment liquid employs a composite formulation combining multiple chemical components (hydroxylamine, hydrazines, first anions, and second anions) in specific proportions. This composite approach achieves superior organic residue removability while the defined composition structure keeps manufacturing complexity controlled through standardized formulation
3Productivity
If miniaturization of semiconductor devices continues, then device density is improved, but treatment precision requirements increase
Solution Approach 1:
The patent optimizes chemical parameters including pH control through anion balance, oxidation-reduction potential via hydroxylamine-hydrazine ratios, and surfactant concentrations to achieve the enhanced treatment precision required for miniaturized semiconductor devices while maintaining high device density
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The treatment liquid demonstrates excellent organic residue removability, stability, and surface smoothness, effectively addressing the challenges of residue removal and stability in semiconductor manufacturing processes.
Implementation Method 1
hydroxylamine
Implementation Method 2
hydrazines
Implementation Method 3
dissolving power for metal residues
Implementation Method 4
chelating agent
Data Source
AI summary
A treatment liquid contains water, hydroxylamine, and one or more kinds of hydrazines selected from the group consisting of hydrazine, a hydrazine salt, and a hydrazine derivative, in which a total content of the hydrazines is 1 part by mass or less with respect to 100 parts by mass of the hydroxylamine.