EUV Generator Airflow Ring to Block Debris and Gas Backflow
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Solution Overview
Problem
Existing EUV lithography systems face challenges in maintaining efficiency due to debris deposition on optical elements and contamination from cleaning gases, which degrade reflectivity and transmissivity, and there is a need for improved methods to manage airflow and gas flow to prevent such issues.
Innovation Solution
The EUV generator incorporates a collector with a first and second focus, a droplet feeder, a laser generator, an airflow control member with hinged parts, and a control gas feeder to manage airflow and gas flow, preventing backflow and contamination, and includes a focus cap with a spectral purity filter to enhance durability and efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If cleaning gas is supplied to remove debris from optical elements, then cleanliness is improved, but gas backflow causes contamination in other areas
Solution Approach 1:
A flow control member with selective permeability is introduced as an intermediary between the cleaning gas supply and the optical elements. This member allows cleaning gas to pass through to remove debris while blocking the backflow of gas to other areas, thus resolving the contradiction between achieving cleanliness and preventing gas contamination
Solution Approach 2:
The flow control member divides the gas flow path into separate zones: one allowing cleaning gas to reach optical elements for debris removal, and another blocking backflow to prevent contamination. This segmentation enables simultaneous achievement of cleanliness and contamination prevention
2Use of energy by moving object
If laser irradiation is increased to generate more EUV light, then light output is improved, but debris deposition on optical elements increases
Solution Approach 1:
The flow control member acts as a mediator that permits the increased laser irradiation and associated debris generation while selectively allowing cleaning gas to reach optical elements and blocking debris-laden gas from contaminating other areas, thus enabling high EUV output without proportional increase in harmful deposition
Solution Approach 2:
The system converts the harmful effect of increased debris deposition (resulting from higher laser irradiation) into a manageable condition by using the same increased gas flow to deliver cleaning gas more effectively to optical elements, where the cleaning function benefits from the increased flow while the flow control member prevents harmful backflow
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents debris deposition and gas contamination, enhancing the EUV generator's strain resistance and maintaining operational efficiency by managing airflow and gas flow, thereby improving the durability and performance of the EUV lithography apparatus.
Implementation Method 1
the LPP method by laser irradiation may generate EUV light from plasma generated by irradiating a target substance with a laser
Implementation Method 2
a collector which concentrates the extreme ultraviolet generated from the source droplet on the discharge port
Data Source
AI summary
An extreme ultraviolet light generator includes a collector including a first focus and a second focus, a droplet feeder configured to provide a source droplet toward the first focus of the collector, a laser generator configured to irradiate a laser toward the first focus of the collector, an airflow controller between the first focus and the second focus of the collector, the airflow controller having a ring shape, and the airflow controller including at least one slit, and a first part and a second part hinged to each other, and a control gas feeder configured to provide a control gas towards the at least one slit of the airflow controller.