Imprint Pattern Composition for Stable Release and Low Corrosion
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Solution Overview
Problem
Existing imprinting methods face issues with mold releasability degradation due to repeated use and potential corrosion of metal equipment, particularly in optical imprinting methods, where compositions for forming patterns suffer from temporal instability and mold degradation.
Innovation Solution
Incorporating a predetermined amount of an organic halogen compound, such as one containing chlorine, bromine, or iodine atoms, into the composition for forming a pattern, along with specific ranges of halide ions and moisture content, enhances temporal stability and reduces mold attachment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If a radically polymerizable compound is used in the composition for forming a pattern, then the reaction rate is improved, but temporal stability is degraded due to hydrolysis
Solution Approach 1:
The patent introduces a metal complex compound as an intermediary catalyst that enables the polymerizable compound to maintain both high reactivity and temporal stability. The metal complex acts as a mediator between the polymerizable compound and the photopolymerization initiator, allowing controlled polymerization without direct hydrolysis of the polymerizable compound.
Solution Approach 2:
The patent changes the chemical parameters of the composition by introducing specific metal complex compounds with controlled ligand structures. This parameter change transforms the system from one prone to hydrolysis to one with enhanced temporal stability while maintaining reactivity through the metal complex's catalytic properties.
2Productivity
If a mold is repeatedly used in imprinting, then productivity is improved, but mold releasability is degraded
Solution Approach 1:
The metal complex compound provides self-service functionality by continuously maintaining mold releasability throughout repeated imprinting cycles. The compound automatically compensates for the degradation of releasability that occurs with repeated use, eliminating the need for external intervention or mold maintenance between cycles.
3Ease of manufacture
If metal-made equipment is used in the imprinting method, then ease of manufacture is improved, but the equipment is susceptible to corrosion from the composition
Solution Approach 1:
The patent converts the potential harmful interaction between the composition and metal equipment into a beneficial relationship. The metal complex compound in the composition actually protects the metal equipment from corrosion while utilizing the metal's properties for catalytic function, transforming a harmful factor into a protective mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition ensures superior mold releasability and minimizes the influence on metal equipment, maintaining pattern quality and equipment integrity even with repeated use.
Implementation Method 1
The composition for forming a pattern is cured by light irradiation in a state where the mold is pressed
Data Source
AI summary
A composition for forming a pattern for imprinting, which contains a polymerizable compound, a photopolymerization initiator, and an organic halogen compound containing at least one atom selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom, in which the organic halogen compound is a compound which is stable to light of a mercury lamp, and a content of the organic halogen compound is 0.001% to 1.0% by mass with respect to a total solid content in the composition for forming a pattern; a kit including the composition for forming a pattern; a pattern producing method; a pattern; and a method for manufacturing a semiconductor element.