Rotating Liquid EUV Light Source With Electric-Field Plasma Boost
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Solution Overview
Problem
Existing EUV light source apparatuses face challenges in achieving stable generation and high luminous efficiency of plasma due to complex configurations and difficulties in supplying EUV raw materials, particularly in LPP method light source apparatuses.
Innovation Solution
A light source apparatus that includes a rotation body, raw material supply section, and an electric field applying section, where a liquid raw material is transformed into plasma by an energy beam, and an electric field is applied to the plasma generation area to enhance plasma luminous efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If LPP method light source apparatus uses laser beam to excite tin droplets for EUV radiation, then plasma generation is achieved, but the configuration becomes complex and stable droplet supply becomes difficult
Solution Approach 1:
The patent replaces the mechanical droplet supply system with an electric field-based liquid raw material supply system. The liquid raw material is supplied in liquid form rather than as droplets, and an electric field is applied to assist vaporization and plasma generation, eliminating the need for complex droplet formation and supply mechanisms while achieving stable plasma generation
Solution Approach 2:
The patent changes the physical state parameter of the raw material from droplet form to liquid form, and introduces an electric field parameter to assist in the vaporization and plasma generation process. This parameter change simplifies the supply system while maintaining reliable plasma generation
2Reliability
If DPP or LDP method light source apparatus uses discharge between electrodes to generate plasma, then plasma generation is achieved, but debris from EUV raw materials accumulates
Solution Approach 1:
The patent replaces the discharge-based plasma generation mechanism with a laser beam-based excitation mechanism. The liquid raw material is vaporized and excited by laser beam irradiation, eliminating the electrode discharge process that generates debris, while still achieving reliable plasma generation for EUV radiation
Solution Approach 2:
The patent introduces an electric field as an intermediary to assist in the vaporization and plasma generation process. The electric field acts between the liquid raw material and the laser beam, facilitating efficient energy transfer and plasma formation without direct electrode contact, thereby preventing debris accumulation
3Illumination intensity
If liquid raw material is vaporized and continuously irradiated with energy beam to generate plasma, then radiation intensity increases, but luminous efficiency needs improvement
Solution Approach 1:
The patent applies an electric field to change the energy state parameters of the vaporized raw material, enhancing the luminous efficiency of plasma generation. The electric field assists in organizing and energizing the plasma, improving the conversion efficiency of input energy to useful radiation while maintaining high radiation intensity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus improves the luminous efficiency of plasma generation by applying an electric field to the plasma generation area, stabilizing the plasma production process and enhancing radiation intensity.
Implementation Method 1
an energy beam transforms a liquid raw material into plasma to extract radiation
Implementation Method 2
an electric field is applied to the plasma generation area, in which plasma is generated by irradiation of the energy beam
Data Source
AI summary
A light source apparatus, in which an energy beam transforms a liquid raw material into plasma to extract radiation, includes a rotation body, a raw material supply section, and an electric field applying section. The rotation body is disposed at a position onto which the energy beam is incident. The raw material supply section supplies the liquid raw material to the rotation body. The electric field applying section is set to a potential different from a potential of the liquid raw material that has been supplied to the rotation body, and applies an electric field to a plasma generation area in which plasma is to be generated by irradiation of the energy beam.